2007
DOI: 10.1063/1.2711413
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Mode transition in radio-frequency atmospheric argon discharges with and without dielectric barriers

Abstract: Citation: SHI, J.J. and KONG, M.G., 2007. Mode transition in radio-frequency atmospheric argon discharges with and without dielectric barriers.

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Cited by 45 publications
(36 citation statements)
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“…It is normally believed that operation in the ␥-mode at atmospheric pressure leads to a constriction of the discharge. 17,18 The discharges described in this letter, however, are diffuse unless otherwise noted. Therefore, the question of whether microdischarges operate in the ␣-mode against theoretical predictions in 2 and 7 or in a diffuse ͑rather than the typical constricted͒ ␥-mode arises.…”
Section: -mentioning
confidence: 99%
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“…It is normally believed that operation in the ␥-mode at atmospheric pressure leads to a constriction of the discharge. 17,18 The discharges described in this letter, however, are diffuse unless otherwise noted. Therefore, the question of whether microdischarges operate in the ␣-mode against theoretical predictions in 2 and 7 or in a diffuse ͑rather than the typical constricted͒ ␥-mode arises.…”
Section: -mentioning
confidence: 99%
“…Therefore, we conclude that rf microdischarges operate in a diffused ␥-mode and that only at high power the microdischarge constricts radially as it is typically observed in millimeter-size atmospheric-pressure ␥ discharges. 17,18 The reasons for the constriction are subject of future investigations.…”
Section: -mentioning
confidence: 99%
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“…The dominant mechanism depends on the amplitude of the voltage or the input power [51]. In this study, the first breakdown of the plasma cannot be obtained by the single RF voltage, an additional LF voltage must be supplied in order to produce a stable RF discharge.…”
Section: Rf Dischargementioning
confidence: 99%
“…1 Atmospheric pressure plasma jet (APPJ) is a facile tool for plasma beam production and has received much attention because of its prospect in low-temperature processing of materials. [2][3][4][5][6][7][8][9][10][11][12][13][14] However, it is generally difficult to prepare high-quality thin films using an APPJ system. Therefore, a cylindrical nitrogen plasma source operating at low pressure is particularly interesting to produce high activity of plasma for synthesis of nitride films, 15,16 such as GaN, AlN, and SiN x , etc.…”
Section: Introductionmentioning
confidence: 99%