Mode Transition Induced by Low-Frequency Current in Dual-Frequency Capacitive Discharges

Kim, H. C.; Lee, J. K.

doi:10.1103/physrevlett.93.085003

Cited by 119 publications

(55 citation statements)

References 18 publications

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“…Various physical mechanisms produce coupling between the two frequencies, and these effects have been explored in general terms in a number of recent papers, e.g. [1,2,3,4,5,6]. The purpose of the present paper is to discuss the electron heating mechanisms that operate in dual-frequency discharges-in particular, to elucidate their nature and significance, and as far as possible supply convenient formulae that may be used as elements in a comprehensive theoretical understanding of these discharges.…”

Section: Introductionmentioning

confidence: 99%

Electron heating mechanisms in dual-frequency capacitive discharges

Turner

Chabert

2007

Plasma Sources Sci. Technol.

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Abstract. We discuss electron heating mechanisms in the sheath regions of dualfrequency capacitive discharges, with the twin aims of identifying the dominant mechanisms and supplying closed-form expressions from which the heating power can be estimated. We show that the heating effect produced by either Ohmic or collisionless heating is much larger when the discharge is excited by a superposition of currents at two frequencies than if either current had acted alone. This coupling effect occurs because the lower frequency current, while not directly heating the electrons to any great extent, strongly affects the spatial structure of the discharge in the sheath regions.

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Section: Introductionmentioning

confidence: 99%

Electron heating mechanisms in dual-frequency capacitive discharges

Turner

Chabert

2007

Plasma Sources Sci. Technol.

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“…[1][2][3][4][5][6][7][8][9][10] This separate control of the mean energy and flux of the charged particles in capacitively coupled radio frequency discharges is one of the most important issues for various applications in plasma processing. 11,12 For instance, in the Plasma Enhanced Chemical Vapor Deposition (PECVD) processes which are used for solar cell manufacturing, this separate control is most relevant.…”

Section: Introductionmentioning

confidence: 99%

Negative resistance phenomenon in dual-frequency capacitively coupled plasma-enhanced chemical vapor deposition system for photovoltaic manufacturing process

Kwon

Rehman

Won

et al. 2012

Journal of Applied Physics

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The validity of effective frequency concept is investigated for dual-frequency (DF) capacitively coupled plasma (CCP) discharges by using particle-in-cell/Monte Carlo collision simulations. This concept helps in analyzing DF CCP discharges in a fashion similar to single-frequency (SF) CCP discharges with effective parameters. Unlike the driving frequency of SF CCP discharges, the effective frequency in DF CCP is dependent on the ratio of the two driving currents (or voltages) and this characteristic makes it possible to control the ion flux and the ion bombardment energy independently. This separate control principally allows to increase the ion flux and plasma density for high deposition rates, while keeping the ion mean energy constant at low values to prevent the bombardment of highly energetic ions at the substrate surface to avoid unwanted damage in the solar cell manufacturing. The abrupt transition of the effective frequency leads to the phenomenon of negative resistance which is one of the several physical phenomena associated uniquely with DF CCP discharges. Using effective frequency concept, the plasma characteristics have been investigated in the negative resistance regime for solar cell manufacturing.

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“…1 They are typically operated in the electrostatic regime, for which the excitation wavelength is much larger than the electrode size, and the plasma skin depth ␦ is much larger than the electrode spacing. However, recently, the excitation frequency has been increased considerably, because higher plasma density is expected at higher excitation frequencies 2-7 ͑a low frequency may be added for independent control of the ion energy 8,9 ͒. Additionally, the electrode size has also been increased to facilitate increased process throughput.…”

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confidence: 97%

Experimental observation of the inductive electric field and related plasma nonuniformity in high frequency capacitive discharge

Ahn

Chang

2008

Applied Physics Letters

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To elucidate plasma nonuniformity in high frequency capacitive discharges, Langmuir probe and B-dot probe measurements were carried out in the radial direction in a cylindrical capacitive discharge driven at 90MHz with argon pressures of 50 and 400mTorr. Through the measurements, a significant inductive electric field (i.e., time-varying magnetic field) was observed at the radial edge, and it was found that the inductive electric field creates strong plasma nonuniformity at high pressure operation. The plasma nonuniformity at high pressure operation is physically similar to the E-H mode transition typically observed in inductive discharges. This result agrees well with the theories of electromagnetic effects in large area and/or high frequency capacitive discharges.

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Mode Transition Induced by Low-Frequency Current in Dual-Frequency Capacitive Discharges

Cited by 119 publications

References 18 publications

Electron heating mechanisms in dual-frequency capacitive discharges

Electron heating mechanisms in dual-frequency capacitive discharges

Negative resistance phenomenon in dual-frequency capacitively coupled plasma-enhanced chemical vapor deposition system for photovoltaic manufacturing process

Experimental observation of the inductive electric field and related plasma nonuniformity in high frequency capacitive discharge

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