Model-based characterisation of complex periodic nanostructures by white-light Mueller-matrix Fourier scatterometry

Gödecke, Maria Laura; Frenner, Karsten

doi:10.37188/lam.2021.018

Cited by 7 publications

(5 citation statements)

References 26 publications

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“…High-precision multi-sub-envelope zero-order pole-bias-compensation white-light interferometric topography measurement method Dong Yao 1,3* , , Hangang Liang 1,2,3 , Dapeng Tian 1,3 , Chunhui Yan 1,3 , Mingyu Yang 1,3 , Lingtong Meng 1,3 , Xu Guo 1,3 , Yukun Wang 1,3 , Ye Yuan 1,3 , Yanping Cheng 1,3 , Honghai Shen 1,3 and Chunming Jiang 1,2,3 Introduction Scanning white-light interferometry (SWLI) technology can be used to detect threedimensional (3D) morphology of sub-wavelength order, with measurement accuracy reaching the order of nanometers [1,2]. Compared to single-wavelength interferometry, SWLI has an ultra-wide illumination light source spectrum and therefore a shorter spatial coherence length, which allows SWLI technology to effectively eliminate phase blur problems.…”

Section: Researchmentioning

confidence: 99%

High-precision multi-sub-envelope zero-order pole-bias-compensation white-light interferometric topography measurement method

Yao

Liang

Tian

et al. 2022

Preprint

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The mZPBC white-light topography measurement method is proposed. In contrast with other methods, this algorithm has a real physical model and directly solves the accurate topography information in spatial domain. We obtain the mathematical expression of this method in theory, verify the noise suppression effect by simulation, and perform the actual measurement experiment to verify the accuracy and efficiency.

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Section: Researchmentioning

confidence: 99%

High-precision multi-sub-envelope zero-order pole-bias-compensation white-light interferometric topography measurement method

Yao

Liang

Tian

et al. 2022

Preprint

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“…In response to these challenges, scatterometry-based metrology techniques have emerged as a promising alternative [24,25]. Scatterometry, rooted in the analysis of scattered light, encompasses various modalities, including spectroscopic ellipsometry (SE) [26], Mueller-matrix Fourier scatterometry (MMFS) [27], white light interference Fourier scatterometry (WL-IFS) [28], and critical dimension small angle x-ray scattering (CD-SAXS) [29], offering unique capabilities for nanostructure characterization. All these modalities come with their advantages and disadvantages.…”

Section: Introductionmentioning

confidence: 99%

Investigation of coherent Fourier scatterometry as a calibration tool for determination of steep side wall angle and height of a nanostructure

Paul,

Rafighdoost,

Dou

et al. 2024

Meas. Sci. Technol.

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Nanostructures with steep side wall angles (swa) play a pivotal role in various technological applications. Accurate characterization of these nanostructures is crucial for optimizing their performance. In this study, we propose a far-field detection method based on coherent Fourier scatterometry (CFS) for accurate quantification of steep swa and heights in cliff-like nanostructures. Our approach introduces a parameter termed “visibility”, derived from the unique far-field signatures of cliff-like nanostructures. This parameter serves as a quantitative metric for the calibration of swa and heights. The heightened sensitivity of our method is demonstrated, particularly when the incident polarization is perpendicular to the invariant direction of the nanostructure for swa calibration, while both polarization states exhibit sensitivity to height calibration. Furthermore, a comprehensive sensitivity analysis reveals the stable nature of our method, showcasing that even with fluctuations of ±10 nm in the position of the nanostructure, the resulting swa remains stable within a range of ±0.5°. The exponential variation of the visibility parameter with edge roundness is observed, with fluctuations in edge roundness within 10 nm resulting in swa variations within 1.7° for both polarization states. In experimental validations, our results demonstrate reasonable agreement between CFS-derived and AFM measurements. The AFM data for swa (77.99° ± 1.37°) and height (148.35 nm ±2.11 nm) are corroborated with CFS-derived value of swa (77.75° ± 3.61°, 78.36° ± 3.89°) and height (149.42 nm ±1.66 nm, 150.05 nm ±1.04 nm) obtained from calibration curves for TM and TE incident beams, respectively. Overall, our findings underscore CFS as a potential and reliable tool for nanostructure characterization, offering precise measurements that are pivotal for advancing nanotechnology.

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“…Our goal is to evaluate and compare the performance of the two methods and propose a strategy to combine them. It is well accepted that Fourier scatterometry surpasses conventional optical ellipsometry in terms of efficiency and sensitivity 4 . We thus focus on parameter reconstruction within the framework of Fourier scatterometry.…”

Section: Introductionmentioning

confidence: 99%

“…This network is designated as Resnet-A. The second kind is images of Mueller matrix at the pupil plane, which are calculated from the first-kind datasets 4 . This network is designated as Resnet-B.…”

Section: Introductionmentioning

confidence: 99%

Comparative analysis of grating reconstruction: deep learning versus Levenberg-Marquardt methods

Fu,

Wang,

Frenner

et al. 2023

Modeling Aspects in Optical Metrology IX

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Model-based optical scatterometry is a widely utilized non-destructive measuring technique in semiconductor manufacturing for retrieving features on wafers. It offers an attractive solution for quality control and process monitoring. However, the increasing complexity of 3D nanoscale device structures presents significant challenges for optical scatterometry. To address these challenges, it is crucial to integrate different methods and create a hybrid metrology approach that could encompass measurements, modeling, and data analysis techniques. To tackle this objective, we explore in this study two alternative approaches for parameter reconstruction, distinct from the conventional library search method. The first approach utilizes a neural network based on a Resnet architecture, while the second approach employs the Levenberg-Marquardt algorithm, a nonlinear least square fitting technique. By performing a comparative analysis of the two methods, we propose a strategy to combine them for accurate and efficient parameter reconstructions.

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Model-based characterisation of complex periodic nanostructures by white-light Mueller-matrix Fourier scatterometry

Cited by 7 publications

References 26 publications

High-precision multi-sub-envelope zero-order pole-bias-compensation white-light interferometric topography measurement method

High-precision multi-sub-envelope zero-order pole-bias-compensation white-light interferometric topography measurement method

Investigation of coherent Fourier scatterometry as a calibration tool for determination of steep side wall angle and height of a nanostructure

Comparative analysis of grating reconstruction: deep learning versus Levenberg-Marquardt methods

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