2003
DOI: 10.1103/physrevb.67.153307
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Model forCdefect on Si(100):  The dissociative adsorption of a single water molecule on two adjacent dimers

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Cited by 81 publications
(85 citation statements)
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“…It should be noted that during deposition the number of the stable chain terminations increased. This could be explained by increasing number of C-type defects during the deposition in agreement with the interpretation of these defects as contaminants from residual gas [3,4]. Detail of Ag chain decay is shown in Fig.…”
Section: Methodssupporting
confidence: 57%
See 1 more Smart Citation
“…It should be noted that during deposition the number of the stable chain terminations increased. This could be explained by increasing number of C-type defects during the deposition in agreement with the interpretation of these defects as contaminants from residual gas [3,4]. Detail of Ag chain decay is shown in Fig.…”
Section: Methodssupporting
confidence: 57%
“…Contrary to A and Btype defects, consensus on C-type defect structure is quite unsettled. Recently, two groups proposed independently the origin of C-type defect in a dissociated H 2 O molecule adsorbed on two adjacent Si dimers [3,4]. It has been proposed that the C-type defect changes significantly the reactivity of two remaining unreacted Si atoms with free dangling bonds (one per each Si dimer).…”
Section: Introductionmentioning
confidence: 99%
“…Both of them show a semiconducting character in local I-V characteristics [5,7]. Adsorption of dissociated water molecules results in so-called C-type defects [11,12]. These defects are seen as single or double Si atom vacancies in neighboring dimers in STM images.…”
Section: Characterization Of the Investigated Systemmentioning
confidence: 99%
“…In the meantime, the first adsorption site has been confirmed by STM. In addition, it was discovered that CO adsorbs in islands around defect sites of type C [17], which have been identified as being caused by dissociative adsorption of water on two atoms of adjacent Si dimers [18].…”
Section: Introductionmentioning
confidence: 99%