Modeling and measurement of monomer pressure evolution in an inductively coupled pulsed plasma reactor for thin polymer films

Shepsis, L.V.; Pedrow, P.D.; Mahalingam, R.; Osman, M.A.

doi:10.1109/27.902244

Cited by 2 publications

(1 citation statement)

References 14 publications

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“…Inductively coupled plasmas (ICP) are widely used in many material processing applications. Examples include manufacturing of micro‐electronic components;1 nano‐scale biomaterial processing;2 and deposition of thin polymer films 3. Measurement of crucial plasma parameters (such as concentration of active species) is essential in understanding of the mechanisms involved in plasma treatments, as well as for their optimization.…”

Section: Introductionmentioning

confidence: 99%

Density Measurement of Helium Metastable States by Absorption Spectroscopy in an Inductively Coupled Plasma

Liu

Chen

2005

Plasma Processes & Polymers

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Summary: The densities of He metastable states 23S1 and 21S0 are measured by absorption spectroscopy. The emission lines 388.9 nm and 501.6 nm from inductively coupled He plasmas doped with 5% of nitrogen are used in order to determine the gas temperature. The operating conditions are the following: gas pressures between 0.4 Pa and 2 Pa; and r.f. powers between 100 and 700 W. The measured values for the metastables densities were found to range from 3.9 × 1015 m−3 to 2.3 × 1016 m−3 for the 23S1 state, and from 9.5 × 1014 m−3 to 6.9 × 1015 m−3 for the 21S0 state, respectively. For a constant r.f. power level, the density first increases and then decreases with rising the pressure. For a fixed value of the pressure, it increases monotonically with increasing the r.f. power. The densities of the metastable states are lower than that of the ground state by four orders of magnitude.

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Section: Introductionmentioning

confidence: 99%