2006
DOI: 10.1016/j.microrel.2005.09.004
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Modeling and simulation of resistivity of nanometer scale copper

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Cited by 38 publications
(22 citation statements)
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“…As the film thickness scales down to 23 nm, the resistivity Figure 6. The ratio of film resistance to bulk resistance (ρ s /ρ 0 ) as a function of film thickness, as calculated based on the Fuchs-Sondheimer model [26][27][28]. p is the probability that an electron is specularly reflected from the surfaces.…”
Section: Discussionmentioning
confidence: 99%
“…As the film thickness scales down to 23 nm, the resistivity Figure 6. The ratio of film resistance to bulk resistance (ρ s /ρ 0 ) as a function of film thickness, as calculated based on the Fuchs-Sondheimer model [26][27][28]. p is the probability that an electron is specularly reflected from the surfaces.…”
Section: Discussionmentioning
confidence: 99%
“…For consistency, the hypotheses applied in the simulation method were summarized here: (a) The free-electron-gas model (also denoted as the Drude model) [ 15 ] was applied. (b) Each electron moves along a straight line at the Fermi velocity until terminated at a boundary surface or after a sufficiently long path has been traveled [ 16 , 17 ]. (c) Only the Z component of free path contributes to the EMFP.…”
Section: Methodsmentioning
confidence: 99%
“…The statistical simulation method [10,11] applied here was based on the following hypothesis: electrons in the HNW are free electrons; each electron moves along a straight line with the Fermi velocity until either terminated at the boundary or until a long enough path has been traveled [17]. More details can be found in Refs.…”
Section: Electronic Thermal Conductivity Simulationmentioning
confidence: 99%