Modeling carbon contamination of extreme ultraviolet (EUV) optics

Hollenshead, Jeromy T.; Klebanoff, Leonard E.

doi:10.1117/12.537471

Cited by 8 publications

(8 citation statements)

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“…Several models of the photochemical reaction under EUV irradiation have been reported [5][6][7][8][9] . In this study we used NIST (National Institute of Standards and Technology) simple thick-C-growth model 10 shown in Fig.…”

Section: Fitted Results Of Carbon Deposition Ratementioning

confidence: 99%

Analysis of carbon deposition on multilayer mirrors by using two different beamlines

Nakayama

Miyake

Takase

et al. 2009

Alternative Lithographic Technologies

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It is very important to mitigate oxidation of multilayer mirrors (MLMs) and carbon deposition onto MLMs to extend the lifetime of EUV exposure tool. In order to estimate the lifetime, we have to figure out scaling law. Previous results at EUVA have shown that carbon deposition rate on MLMs is not proportional to every hydrocarbon partial pressure and every EUV intensity 3-4 . In this study we focused on carbon deposition on Si-capped multilayer mirror. We made experiments of EUV irradiation to the MLMs using two different apparatuses. One is connected to a beamline (SBL-2) of synchrotron radiation facility Super-ALIS in the NTT Atsugi research and development center, and the other is connected to a beamline (BL9) of synchrotron radiation facility New SUBARU in the University of Hyogo. As the result of experiments, we found that different carbon deposition rate occurred on the different beamlines, although they have the same average EUV intensity. We present differences of carbon deposition rate on MLMs between two different beamlines and estimation of carbon deposition rate on EUV tool analyzing dependences of carbon deposition rate on characteristics of EUV source.

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Section: Fitted Results Of Carbon Deposition Ratementioning

confidence: 99%

Analysis of carbon deposition on multilayer mirrors by using two different beamlines

Nakayama

Miyake

Takase

et al. 2009

Alternative Lithographic Technologies

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“…The maximum reflectivity reached with the multilayer mirrors is about 70% . The combination of exposure to high-intensity EUV radiation (hν = 92 eV) and the presence of hydrocarbons and water in the residual gas causes fast degradation of the optical reflectivity due to growth of carbon layers and the oxidation of the multilayer − (cf. Figure ).…”

Section: Applications Of Ruo2 In Electronic Industrymentioning

confidence: 99%

“…(a) EUV light induced carbon uptake: adsorption, diffusion, and dissociation of large parent hydrocarbons into a graphitic-like, but partially hydrogenated, layer . (b) EUV-induced oxidation of the EUVL mirror by water splitting .…”

Section: Applications Of Ruo2 In Electronic Industrymentioning

confidence: 99%

Surface Chemistry of Ruthenium Dioxide in Heterogeneous Catalysis and Electrocatalysis: From Fundamental to Applied Research

Over¹

2012

Chem. Rev.

630

643

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CONTENTS 1. Introduction 3357 2. Physicochemical Properties of Ruthenium Oxides 3358 3. Synthesis of RuO 2 3360 3.1. RuO 2 Single Crystals 3360 3.2. Polycrystalline RuO 2 3361 3.3. RuO 2 Thin Film Preparation 3361 3.4. Supported RuO 2 Nanoparticles 3362 3.5. Nanoscale RuO 2 in Diverse Forms 3362 3.6. Hydrous RuO 2 •xH 2 O 3363 3.7. RuO 2 -Based Electrode Coatings 3364 4. Complex Surface-Redox-Chemistry of Ruthenium 3364 4.1. Gas Phase Oxidation of Single Crystalline Ruthenium Surfaces 3364 4.1.1. Ru(0001) 3364 4.1.2. Ru(101̅ 0) 3368 4.2. Electro-oxidation of Ru(0001) 3369 4.3. Reduction of RuO 2 (110) 3369 4.3.1. Reduction by Hydrogen 3370 4.3.2. Reduction by CO 3370 4.3.3. Reduction by Methanol 3370 4.4. Reduction and Oxidation Behavior of Structurally More Complex Ru-Based Materials 3370 4.4.1. Polycrystalline Powder and Supported Nanoparticles of Ru and RuO 2 3370 4.4.2. Polycrystalline Ru Films 3370 4.5. Redox Surface Chemistry of other Platinum Group Metal Single Crystals 3371 4.5.1. Rhodium 3371 4.5.2. Palladium 3372 4.5.3. Platinum 3373 4.5.4. Iridium 3373 5. Atomic Scale Chemistry and Properties of Single-Crystalline RuO 2 Surfaces 3373 5.1. RuO 2 (110) Surface 3374 5.1.1. General (Atomic Scale) Properties of the Stoichiometric RuO 2 (110) Surfaces 3374 5.1.2. Chemical Properties of the RuO 2 (110) Surface: General Adsorption and Reaction Behavior 3376 5.1.3. Interaction of Oxygen with the RuO 2 (110) Surface 3378 5.1.4. Interaction of CO with the RuO 2 (110) Surface 3378 5.1.5. Interaction of H 2 with the RuO 2 (110) Surface 3379 5.1.6. Interaction of Water with RuO 2 (110) Surface 3379 5.1.7. Chemical Reduction of the RuO 2 (110) Surface 3380 5.2. RuO 2 (100) Surface 3380 5.2.1. General Properties of RuO 2 (100) 5.2.2. Adsorption Properties of RuO 2 (100) 5.3. Comparison with Rutile TiO 2 Single Crystals 6. Case Study: CO Oxidation over RuO 2 6.1. Scientific Background 6.2. CO Oxidation over RuO 2 (110): Reaction Mechanism 6.2.1. Experimental Evidence 6.2.2. Theoretical Modeling 6.3. CO Oxidation over RuO 2 Powder and Supported RuO 2 Catalysts: Bridging the Materials Gap 6.4. Deactivation and Poisoning of RuO 2 -Based Catalysts 6.4.1. Structural Deactivation 6.4.2. Poisoning of the Catalyst 6.5. Comparison with the Electrochemical Oxidation of CO at RuO 2 (100) Model Electrodes 6.6. CO Oxidation over RuO 2 : Concluding Remarks and Open Questions 7. Application of RuO 2 in Heterogeneous Catalysis 7.1. Low Temperature CO Oxidation 7.2. Water Production 7.3. Methanol Oxidation 7.4. Ammonia Oxidation and Related Reactions 7.5. HCl Oxidation: Deacon Process 8. Application of RuO 2 in Electrocatalysis 8.1. General Electrochemical Properties of RuO 2 8.2. Hydrogen Evolution Reaction (HER) 8.3. Chlor-Alkali Electrolysis: Dimensionally Stable Anode (DSA) 8.4. Oxygen Evolution Reaction (OER): Electrolysis of Water 8.5. Oxygen Reduction Reaction (ORR) 9. Energy-Related Applications of RuO 2 9.1. Super Capacitors 9.2. Fuel Cells 9.3. Rechargeable Li-Ion Batteries 9.4. Photocatalysis 10. Applications of RuO 2 in Ele...

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“…Several models of the photochemical reaction have been reported [1][2][3][4][5] . We use the NIST (National Institute of Standards and Technology) simple thick-C-growth model.…”

Section: Fitted Results Of Carbon Deposition Ratementioning

confidence: 99%

Development status of Canon's full-field EUVL tool

Hasegawa

Uzawa

Honda

et al. 2009

Alternative Lithographic Technologies

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EUVL is the most promising candidate of 32 nm generations and beyond. In this paper, we present Canon's development status of EUVL technologies. The system design of the EUV full field high volume manufacturing tool (VS2) is under way. The specification of VS2 is presented in this paper. The fabrication of six-aspheric-mirror prototype projection optics (PO1) of NA 0.3 has been started. The PO1 is fabricated to evaluate and improve our technologies of polishing and measuring the figure of mirrors. We present some results of the figuring accuracy of the mirror. EUVL will be required to resolve sub-twenty nm L&S patterns. We are studying off-axis illumination technologies and high-NA technologies. The simulation results of the resolution capability and the DOF are presented.

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Modeling carbon contamination of extreme ultraviolet (EUV) optics

Cited by 8 publications

References 0 publications

Analysis of carbon deposition on multilayer mirrors by using two different beamlines

Analysis of carbon deposition on multilayer mirrors by using two different beamlines

Surface Chemistry of Ruthenium Dioxide in Heterogeneous Catalysis and Electrocatalysis: From Fundamental to Applied Research

Development status of Canon's full-field EUVL tool

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