The detrimental impact of organic contaminants on optical
components
poses a significant obstacle to high-energy laser systems. However,
irregularities or defects on the surface of optical components during
manufacturing can affect the process of organic contaminant removal.
Thus, a comprehensive understanding of the intricate interplay among
surface roughness, contaminant absorption, and ablation is essential
to effectively address the challenges of laser-induced damage. In
this study, a molecular dynamics approach was employed to investigate
the interaction between laser-fused silica and contaminants and to
analyze the influence of surface roughness on the removal of contaminants
from fused silica. Research findings demonstrate that during laser
irradiation, organic contaminants on the surface of mechanical components
diffuse into the optical elements. As the laser flux increases, the
contaminants gradually decompose into smaller molecular clusters.
Additionally, the phenomenon of contaminant ablation is observed to
consist of two distinct phases: the “Thermal expansion phase”
and the “Thermal ablation phase.” The study examines
the impact of substrate roughness on the contaminant removal in these
two phases. It is found that a higher surface roughness leads to stronger
thermal expansion and vaporization of contaminants. With increasing
roughness of the fused silica substrate, the corresponding van der
Waals energy and pressure decrease under the same laser fluence, making
the removal of contaminants easier. These results provide valuable
insights into the interaction between laser irradiation and organic
contaminants.