2018
DOI: 10.12693/aphyspola.134.667
|View full text |Cite
|
Sign up to set email alerts
|

Modeling of Double Cross-Slip by Means of Geodesic Curvature Driven Flow

Abstract: In this paper we develop a model for double cross-slip in fcc crystals. The double cross-slip mechanism is demonstrated by a simulation of an overcoming of a particle exerting spherically symmetric repulsive stress field. The cross-slip is treated as a deterministic, stress-controlled process. For the identification of the cross-slip, we use a criterion based on evaluation of stresses exerted on a tip of a screw part of a dislocation resolved in the primary plane and in the cross-slip plane. The motion of a di… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2020
2020
2021
2021

Publication Types

Select...
2
1

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(1 citation statement)
references
References 9 publications
0
1
0
Order By: Relevance
“…In fact, our approach below reveals that an approximation by straight lines may cause a large error if not dealt with carefully. Another set of examples are the schemes used in [GTS00] and in the paper series by Beneš, Kratochvíl, Pauš et al (see [KBKP18] and references therein), which are based on the expansion in (7), but neglect the nonlocal contribution Ψ(x). This creates a relative discretization error of size O(1/| log ε|).…”
Section: Discretizations Of F ε and F εmentioning
confidence: 99%
“…In fact, our approach below reveals that an approximation by straight lines may cause a large error if not dealt with carefully. Another set of examples are the schemes used in [GTS00] and in the paper series by Beneš, Kratochvíl, Pauš et al (see [KBKP18] and references therein), which are based on the expansion in (7), but neglect the nonlocal contribution Ψ(x). This creates a relative discretization error of size O(1/| log ε|).…”
Section: Discretizations Of F ε and F εmentioning
confidence: 99%