Modeling of multiple-optical-axis pattern-integrated interference lithography systems

Abstract

The image quality and collimation in a multiple-optical-axis pattern-integrated interference lithography system are evaluated for an elementary optical system composed of single-element lenses. Image quality and collimation are individually and jointly optimized for these lenses. Example images for a jointly optimized system are simulated using a combination of ray tracing and Fourier analysis. Even with these nonoptimized components, reasonable fidelity is shown to be possible.

Optical fabrication of wavy lattices and photonic lattices with defects in photorefractive crystal by single step projection method

“…The approach of multiple beam interference is a handy and effective method in forming sundry periodic intensity patterns as well as lattice intensity patterns with defects [18][19][20]. The great majority of optically induced photonic lattices are formed use the multiple beam interference.…”

Focus on institutional research at Georgia Tech: editorial

“…The advancements in optical system measurements is a common theme among the papers. Measurements include ultra-short laser pulses, atmospheric aerosols, and field of view losses in bathymetric lidar [2][3][4][5][6][7][8].…”

“…Along the lines of measurements of isotope identification, developments of new scintillator material combined with spectroscopy are presented for use in the radiation scanners for increased throughput as compared with current techniques [3]. The other papers present simulations and models of imaging systems with partially coherent light and phase reconstruction techniques, or through multiple optical axis pattern integrated inference exposure systems [4]. The authors present the systems and unique approaches to analysis and design.…”