Modeling of the substrate topography upon nanosized profiling by focused ion beams

Fabrication of advanced probes for atomic force microscopy using focused ion beam

“…To automate the process of AFM probe fabrication by FIB is used Unigen 3.2 software which was developed in the Southern Federal University [6]. The software allows to generate patterns for FIB milling and deposition as BMP files or ASCII based stream files based on designed 3D profile (as a mathematical formula, a curve or a standard figure).…”

“…The following FIB parameters were used: the accelerating voltage of the ion beam -30 keV; the ion beam current -30 pA; and the dwell time of the ion beam -1.0 μs. The chamber pressure after introducing W(CO) 6 gas was 1 × 10 −4 Pa. A bitmap of the desired probe structure was created by using Unigen 3.2 software, and then uploaded into the FIB software [6]. With these parameters, the process of a probe tip formation takes about 5 min, including the milling and deposition operations.…”

Planar nanosized field emission cathodes on the basis of graphene/semi-insulating silicon carbide fabricated by focused ion beam

“…In this case, FIB allows to form planar anode and cathode in a single technological cycle [21][22][23][24][25]. Other mask technology is more labor intensive, it requires the use of specialized templates, more time, additional photolithography operations and hinders the formation of nanosized elements based on graphene/SiC.…”