2020
DOI: 10.2478/ausi-2020-0008
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Modeling reactive magnetron sputtering: a survey of different modeling approaches

Abstract: The paper focuses on providing an insight into the current state of computational modeling regarding reactive magnetron sputtering systems. A detailed compilation of developed models is gathered and grouped into categories based on the phenomena being modeled. The survey covers models developed for the analysis of magnetron discharges, particle-surface interactions at the target and the substrate, as well as macroscopic models. Corresponding software packages available online are also presented. After gaining … Show more

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Cited by 4 publications
(3 citation statements)
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“…Until now, the Berg initial isothermal chemisorption model has been a popular tool for studying the processes of film deposition of simple compounds with the reactive sputtering method [65][66][67]. Undoubtedly, it was an advance in the modeling of the reactive sputtering process.…”
Section: Adequacy Of the Initial Modelmentioning
confidence: 99%
See 1 more Smart Citation
“…Until now, the Berg initial isothermal chemisorption model has been a popular tool for studying the processes of film deposition of simple compounds with the reactive sputtering method [65][66][67]. Undoubtedly, it was an advance in the modeling of the reactive sputtering process.…”
Section: Adequacy Of the Initial Modelmentioning
confidence: 99%
“…The flux sputtered from the target surface includes JtM (pure metal atoms M), JtC 1 (MmOn molecules), and JtC 2 (MN molecules); 5. Each surface consumes reactive gas to maintain surface reactions (66) and (67). Let Qi j denote the fluxes incident on the i-th surface (i = t, s, w) and participating in the formation of oxide MmOn (j = 1) and nitride MN (j = 2).…”
Section: At Any Timementioning
confidence: 99%
“…Due to operational challenges and material loss, computational modelling is an economic way to test and validate complex sputtering models 15 . Fluid models are among the simplest tools for modelling species in hydrodynamic equilibrium and find applications in non-pulsed DCM discharge 16 , high frequency pulsed DC discharge in nitrogen 17 and capacitively couple plasma at RF frequency 18 .…”
Section: Introductionmentioning
confidence: 99%