BSIM (Berkeley Short-Channel IGFET) became the first international industry standard model for simulation of MOS integrated circuits in 1997.The cumulative sales of ICs that have been designed with the aid of BSIM and produced for computing, communication, consumer, and industrial applications is estimated to be around 400 billion US dollars. From 0.35 μm CMOS to multi-gate FinFET, BSIM serves a wide range of technologies. Many China educated researchers have contributed to its success.
BSIM, MOS, compact modeling
Circuit simulation and compact modelAn integrated circuit contains millions to billions of transistors. The functionality and performance of the circuits must be verified by computer simulation before it is committed to expensive fabrication. Circuits are simulated with a method known as SPICE that was developed by Profs. Ron Rohrer and Don Pederson and their students at University of California, Berkeley. The nodal equations of a large nonlinear circuit are solved by efficient matrix analysis. The circuits are nonlinear because the transistors are nonlinear device.The complex behavior of the transistor drain current, I d (V g , V d , V s , V b , L, W), is accurately represented by an analytical equation known as a compact model. If this equation is printed on paper, it may occupy a few pages. The length and complexity of the functions used in the equation have significant impact on the circuit simulation time. It is important to balance the computational efficiency of the model and its accuracy. In addition the terminal charges (or capacitances) are also represented with analytical equations.The compact model equations inevitably contain many adjustable constants known as model