Modelling deuterium release during thermal desorption of D+-irradiated tungsten

Poon, M.C.; Haasz, A.A.; Davis, J.W.

doi:10.1016/j.jnucmat.2007.09.028

Cited by 174 publications

(125 citation statements)

References 33 publications

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“…1. These numbers are in line with modeling results presented in [12]. The frequency pre-factors are of the order of 10 13 −1 but are often left as a fit parameter.…”

Section: Thermal Effusion Spectroscopysupporting

confidence: 87%

Comparison of hydrogen retention in W and W/Ta alloys

Schmid¹,

Rieger²,

Manhard³

2012

Journal of Nuclear Materials

107

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The extreme brittleness of tungsten (W) is one of the challenges of using W as first wall material. One attempt to alleviate this problem is to use W alloys with better mechanical properties. However these alloying elements must not degrade the favorable properties of W with respect to its application at the first wall of fusion devices: low sputter yield and hydrogen inventory. In this work we investigate the hydrogen retention in the recently proposed W/Ta alloys under deuterium ion bombardment. By directly comparing pure W and W/Ta alloys with 1% and 5% Ta content we found that the W/Ta alloys retain significantly more hydrogen than pure W under identical implantation conditions. Our finding of increased hydrogen retention together with the fact that the Ta alloying did not improve the brittleness makes W/Ta alloys an unacceptable choice for the first wall of fusion devices.

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“…1. These numbers are in line with modeling results presented in [12]. The frequency pre-factors are of the order of 10 13 −1 but are often left as a fit parameter.…”

Section: Thermal Effusion Spectroscopysupporting

confidence: 87%

Comparison of hydrogen retention in W and W/Ta alloys

Schmid¹,

Rieger²,

Manhard³

2012

Journal of Nuclear Materials

107

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“…6 a). The second low-intensity peak at 950 K is observed only in the spectrum for the W layer deposited at 323 K. The desorption peak at 700-800 K may be attributed to detrapping of D atoms from vacancies [18], while the high temperature peak at 950 K may correspond to the release of D atoms initially bound on the surface of voids [19] TDS spectra show that the W layers contain He atoms in addition to deuterium (Fig. 6 b).…”

Section: W Layers Deposited With the Use Of Lpg Plasmamentioning

confidence: 93%

Deuterium trapping in tungsten deposition layers formed by deuterium plasma sputtering

Alimov

Roth

Shu

et al. 2010

Journal of Nuclear Materials

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“…Selected mass channels between 2 and 44 amu were recorded as a function of time (so called multiple ion detection mode of the QMS). The following 15 mass channels were recorded: 1, 2, 3,4,12,14,16,17,18,19,20,28,32,40, and 44 amu. Some of them are just measured to assess background emission and to check that no other species are released.…”

Section: Methodsmentioning

confidence: 99%

“…Much work has been performed in the past to relate trap energies to the observed desorption temperatures [12,18,21,26,30]. However, due to differences of the investigated samples and the used experimental settings published data show some scatter.…”

Section: Deuterium Retention Measured By Tpdmentioning

confidence: 99%

“…However, due to differences of the investigated samples and the used experimental settings published data show some scatter. Generally, deuterium released at lower temperature is attributed to deuterium trapped in low-energy traps, such as grain boundaries and dislocations, while D released at higher temperature is attributed to D in high-energy traps, for example vacancies and voids [12,18,21,26,30], but the influence of transport from different depths to the surface is very often neglected. Fig.…”

Section: Deuterium Retention Measured By Tpdmentioning

confidence: 99%

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Comparing deuterium retention in tungsten films measured by temperature programmed desorption and nuclear reaction analysis

Wang

Jacob

Gao

et al. 2013

Nuclear Instruments and Methods in Physics Research Section B:

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Abstract:Tungsten (W) films with thicknesses ranging between 1 and 12 m deposited by magnetron sputtering on silicon substrates were used as a model system for comparing the deuterium (D) retention measured by both temperature programmed desorption (TPD) and nuclear reaction analysis (NRA). Samples were loaded with deuterium ex-situ with an ECR plasma at 370 and 600 K with an energy of 38 eV per deuteron. To avoid diffusion of D into the silicon substrate and to increase adhesion a copper interlayer was applied. The results show that all implanted D atoms were retained exclusively in the W films. The distribution of D is homogenous throughout the W layer with an atomic fraction of 3±0.4×10 -3 . With increasing W thickness the D profile extends to correspondingly larger depths with practically identical D concentration. For W films with a thickness lower than the NRA information depth of about 8 μm the total retained D amount measured by TPD and NRA is in excellent agreement. As expected, for films thicker than the NRA information depth, TPD deviates from NRA.

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Modelling deuterium release during thermal desorption of D+-irradiated tungsten

Cited by 174 publications

References 33 publications

Comparison of hydrogen retention in W and W/Ta alloys

Comparison of hydrogen retention in W and W/Ta alloys

Deuterium trapping in tungsten deposition layers formed by deuterium plasma sputtering

Comparing deuterium retention in tungsten films measured by temperature programmed desorption and nuclear reaction analysis

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