Growth, formation, and stability of anodic oxides obtained on n-InP were investigated by coupling electrochemical methods and X-ray photoelectron spectroscopy ͑XPS͒ analyses. Photocurrent transients and capacitance measurements performed before and after the semiconductor surface oxidation exhibit new electrical interfacial properties, whereas XPS analysis gives access to chemical composition and estimation of oxide layer thickness. In this work, using a galvanostatic method, oxidation of the InP surface has been studied at pH 9 for two current densities: 0.2 and 12 mA cm −2 . Using transient photocurrent and Mott-Schottky behavior as in situ probes, we have pointed out several steps for the InP oxidation process, correlated to a gradual oxide coverage which is evidenced by XPS characterization. The current density chosen to perform the oxidation governs the resulting chemical composition, texture, and electrical properties of the oxide. For low current density, the anodic mechanism varies progressively from a pure semiconductor oxidation process to a solvent oxidation contribution. For high current density, this trend disappears whereas semiconductor oxidation continues to take place.