2012
DOI: 10.1088/0022-3727/45/29/295002
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Modelling of time-dependent dielectric barrier breakdown mechanisms in MgO-based magnetic tunnel junctions

Abstract: An investigation of barrier endurance till electrical breakdown in MgO-based magnetic tunnel junctions (MTJs) is presented. Samples were tested under pulsed electrical stress. By studying the effect of delay between successive pulses, an optimum endurance of MTJs is observed for an intermediate value of delay between pulses corresponding to an optimum trade-off between the average density of charge trapped in the barrier and the amplitude of its time-modulation at each voltage pulse. A charge trapping–detrappi… Show more

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Cited by 18 publications
(5 citation statements)
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“…In fact, as t D increases, defects efficiently diffuse toward the opposite interface, thus making the difference between unipolar and bipolar stress increasingly negligible. Note that the weak dependence of bipolar endurance on t D is consistent with previous results in [32]. On the other hand, our data for unipolar stress show no dramatic dependence on t D , in contrast to [32], which might be explained by a different structure or etch damage profile in our MgO layer.…”
Section: B Impact Of Pulse Delay T Dsupporting
confidence: 89%
“…In fact, as t D increases, defects efficiently diffuse toward the opposite interface, thus making the difference between unipolar and bipolar stress increasingly negligible. Note that the weak dependence of bipolar endurance on t D is consistent with previous results in [32]. On the other hand, our data for unipolar stress show no dramatic dependence on t D , in contrast to [32], which might be explained by a different structure or etch damage profile in our MgO layer.…”
Section: B Impact Of Pulse Delay T Dsupporting
confidence: 89%
“…The current density for switching of STT-MRAM is relatively large and hence large transistors are inevitable to drive it, which thus significantly limits their future use for memory applications 6,7 . The sustainability of higher switching current density of the tunnel barrier also raises reliability issues and leads to the degradation of related MTJ performance, such as, tunnel magneto resistance (TMR), write current margin, and write speed on the time span [8][9][10] . The situation will be even much worse when further scaling of STT-MRAM enters into a nanometer regime.…”
mentioning
confidence: 99%
“…The ability to manipulate the spin of charge carriers has resulted in the giant magnetoresistance effect and magnetic tunnel junction (MTJ), and further realization of non-volatile magnetoresistive random access memories [1][2][3][4]. Among the oxide complexes with high dielectric constant, MgO based MTJs [2,3,[5][6][7] are generally preferred since it enhances spin polarization of charge tunneling via an additional spinfiltering mechanism [3,8]. Although many studies have been carried out on the functional properties of Fe/MgO/Fe MTJs, an understanding for the often observed barrier breakdown and how lattice defects radically modify the paradigm of wave function engineering in the Fe/MgO/Fe MTJs remains [9].…”
Section: Introductionmentioning
confidence: 99%
“…The ability to manipulate the spin of charge carriers has resulted in the giant magnetoresistance effect and magnetic tunnel junction (MTJ), and further realization of non-volatile magnetoresistive random access memories [1][2][3][4]. Among the oxide complexes with high dielectric constant, MgO based MTJs [2,3,[5][6][7] are generally preferred since it enhances spin polarization of charge tunneling via an additional spinfiltering mechanism [3,8].…”
Section: Introductionmentioning
confidence: 99%