2005
DOI: 10.1007/s00339-004-3009-z
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Modification of expanded polytetrafluoroethylene by UV irradiation in reactive and inert atmosphere

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Cited by 15 publications
(13 citation statements)
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“…Another study showed that the extreme sensitivity of the soft segments to UV irradiation could be the reason for the rapid degradation of polyether based PU upon exposure to sun [35]. In our previous work, we found that also the VUV light of the 172 nm Xe 2 * excimer lamp can strongly decrease the mechanical stability of polymer materials [36]. To assess the effect of the VUV treatment on the mechanical stability of the PU foils under investigation, we performed tensile tests.…”
Section: Tensile Test and Microgroove Formationmentioning
confidence: 99%
“…Another study showed that the extreme sensitivity of the soft segments to UV irradiation could be the reason for the rapid degradation of polyether based PU upon exposure to sun [35]. In our previous work, we found that also the VUV light of the 172 nm Xe 2 * excimer lamp can strongly decrease the mechanical stability of polymer materials [36]. To assess the effect of the VUV treatment on the mechanical stability of the PU foils under investigation, we performed tensile tests.…”
Section: Tensile Test and Microgroove Formationmentioning
confidence: 99%
“…In general, processing soft porous materials such as foams and sponges requires precise processing technology. Various techniques have been proposed and investigated for the micromachining of ePTFE, including mechanical processing, synchrotron radiation [2], and nanosecond laser ablations [3,4]. However, sufficiently precise processing has not been realized due to the low melting temperature of ePTFE (T m = 327°C) and its non-uniform bond strength due to its surface roughness [5].…”
Section: Introductionmentioning
confidence: 99%
“…The high wettability of treated surfaces is ascribed to polar groups incorporated into the PTFE surface by substitution of F atoms. The subtraction of F is mediated via atomic H which is generated in the dissociation reaction NH 3 + hν → NH 2 + H [15]. An irradiation in 5 mbar C 2 H 2 leads to effective photo-dissociation, resulting in the deposition of polymerized a:C-H (amorphous hydrogenated carbon) films at polymer samples placed in the reactor [17].…”
Section: Uv-modification Of Polymers In a Reactive Atmospherementioning
confidence: 99%