After the surface of tungsten (W) alloys were roughened by laser, chemical vapor deposition (CVD) of diamond coatings were deposited on three tungsten substrates of pure W, W-1 wt.% La 2 O 3 and W-0.5 wt.% TiC. Under the same growth parameters, the presence of the second phase in the tungsten matrix impeded the growth rate of diamonds, so a completed diamond coating with the thickness of 45 μm and a grain diamond size of 10 μm was obtained only on pure tungsten substrate after running for 10 h. Scanning electron microscopy, X-ray diffraction and Raman spectroscopy tests proved that the obtained diamond coating was compact with a high purity and regular morphology. To verify the chemical and structural stability, the as-obtained diamond-coated tungsten materials were exposed to an ion flux of 1.4 × 10 21 ions m −2 s −1 in D plasma for 30 min. After irradiation, neither delamination, dramatic coating failure nor entire erosion of the coating (graphitization) was observed. The diamond coating can be an effective protective layer to stop tungsten atoms from splashing into the plasma.