2000
DOI: 10.1039/a909049e
|View full text |Cite
|
Sign up to set email alerts
|

Modification of surface properties of alumina by plasma treatment

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

3
8
0
2

Year Published

2001
2001
2021
2021

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 15 publications
(13 citation statements)
references
References 7 publications
3
8
0
2
Order By: Relevance
“…These results are comparable to reported values of 94-110° for other self-assembly conditions [29]. We also measured an average root-mean-square roughness of 2.5 nm after treatment using atomic force microscopy (AlphaSNOM300a WiTec, Ulm, Germany), which differed from the untreated roughness of 0.8 nm.…”
Section: Device Characterizationsupporting
confidence: 89%
“…These results are comparable to reported values of 94-110° for other self-assembly conditions [29]. We also measured an average root-mean-square roughness of 2.5 nm after treatment using atomic force microscopy (AlphaSNOM300a WiTec, Ulm, Germany), which differed from the untreated roughness of 0.8 nm.…”
Section: Device Characterizationsupporting
confidence: 89%
“…Films were produced using a homemade capacitive plasma reactor, with a 40 KHz power supply. 31 The deposition time was always 5 min and the reactant flow roughly 1 g/min. Two deposition modes was used, the so-called open and closed chamber.…”
Section: Methodsmentioning
confidence: 99%
“…Plasma deposited thin films have been used on many applications, such as surface protection and/or modification [16][17][18] and recently organic thin films were tested for adsorption of volatile organic 0925 compounds (VOCs). These films were obtained using monomers in a large range of polarity: ethyl ether, ethyl or methyl acetate, acetone, acetaldehyde and 2-propanol [19][20][21][22][23] and using 40 kHz power supply.…”
Section: Introductionmentioning
confidence: 99%