Modified Thornton model for magnetron sputtered zinc oxide: film structure and etching behaviour

Kluth, O.; Schöpe, G.; Hüpkes, J.; Agashe, Chitra; Müller, J.; Rech, Bernd

doi:10.1016/s0040-6090(03)00949-0

Cited by 339 publications

(200 citation statements)

References 11 publications

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“…The coating morphologies observed for the different thicknesses are similar to those of the Thornton structure zone model [26] , [27] , [28]. Zone 1 (labelled C in Figure 6) consists of narrow crystals separated by voided boundary as is better visualised in Figure 6d.…”

supporting

confidence: 60%

Investigation of DC magnetron-sputtered TiO2 coatings: Effect of coating thickness, structure, and morphology on photocatalytic activity

Davíđsdóttir

Shabadi

Gâlcă

et al. 2014

Applied Surface Science

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The photocatalytic performance of magnetron-sputtered titanium dioxide (TiO 2 ) coatings of different thickness in anatase crystalline structure deposited on aluminium 1050 alloy substrates was investigated using a combination of photo-electrochemistry, methylene blue decomposition, and microscopic and spectroscopic methods, such as high resolution scanning and transmission electron microscopy, atomic force microscopy and ellipsometry. The reaction resistance was measured by AC impedance, while photocurrent measurements were carried out using the zero resistance ammetry (ZRA) method. The results showed that the A c c e p t e d M a n u s c r i p t 2 increased with increased coating thickness, though more rapidly over a range of 100 -500 nm thickness. The dielectric constant also increased linearly with coating thickness

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supporting

confidence: 60%

Investigation of DC magnetron-sputtered TiO2 coatings: Effect of coating thickness, structure, and morphology on photocatalytic activity

Davíđsdóttir

Shabadi

Gâlcă

et al. 2014

Applied Surface Science

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“…The transition between the regimes is not sharp. In order to incorporate these findings into the modified Thornton model introduced by Kluth et al, 30 the substrate temperature axis has to be rescaled taking TAC into account since increasing substrate temperature and increasing TAC both have similar effects on changing growth conditions. Four examples of type II topographies are illustrated by SEM micrographs in Fig.…”

Section: B Postetching Surface Topographymentioning

confidence: 99%

“…For initially smooth sputter-deposited ZnO:Al films a surface texture is realized by postdeposition wet-chemical etching. 29, 30 Kluth et al related the influence of pressure and substrate temperature during radio frequency ͑rf͒ sputter deposition of ZnO:Al at a fixed alumina content of 2 wt % in the sputter target to structural properties and postetching surface topography in a modified Thornton model. 30 They showed that, depending on sputter parameters, craterlike surface topography with typical lateral length scales of 1 -2 m and depths of about 200-400 nm develops in a self-organized fashion.…”

Section: Introductionmentioning

confidence: 99%

The effect of front ZnO:Al surface texture and optical transparency on efficient light trapping in silicon thin-film solar cells

Berginski

Hüpkes

Schulte

et al. 2007

Journal of Applied Physics

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488

275

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This study addresses the material properties of magnetron-sputtered aluminum-doped zinc oxide (ZnO:Al) films and their application as front contacts in silicon thin-film solar cells. Optimized films exhibit high conductivity and transparency, as well as a surface topography with adapted light-scattering properties to induce efficient light trapping in silicon thin-film solar cells. We investigated the influence on the ZnO:Al properties of the amount of alumina in the target as well as the substrate temperature during sputter deposition. The alumina content in the target influences the carrier concentration leading to different conductivity and free carrier absorption in the near infrared. Additionally, a distinct influence on the film growth of the ZnO:Al layer was found. The latter affects the surface topography which develops during wet-chemical etching in diluted hydrochloric acid. Depending on alumina content in the target and heater temperature, three different regimes of etching behavior have been identified. Low amounts of target doping and low heater temperatures result in small and irregular features in the postetching surface topography, which does not scatter the light efficiently. At higher substrate temperatures and target doping levels, more regularly distributed craters evolve with mean opening angles between 120° and 135° and lateral sizes of 1–3μm. These layers are very effective in light scattering. In the third regime—at very high substrate temperatures and high doping levels—the postetching surface is rather flat and almost no light scattering is observed. We applied the ZnO:Al films as front contacts in thin-film silicon solar cells to study their light-trapping ability. While high transparency is a prerequisite, light trapping was improved by using front contacts with a surface topography consisting of relatively uniformly dispersed craters. We have identified a low amount of target doping (0.5–1wt%) and relatively high substrate temperatures (about 350–450°C as sputter parameters enabling short-circuit current densities as high as 26.8mA∕cm2 in μc-Si:H pin cells with an i-layer thickness of 1.9μm. Limitations on further improvements of light-trapping ability are discussed in comparison with the theoretical limitations and Monte Carlo simulations presented in the literature.

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“…Several techniques are available for the deposition of ZnO, among which the most common are metalorganic chemical vapor deposition (MOCVD) [3,4], sputtering [5], molecular beam epitaxy [6] and sol-gel methods [7]. However, for large-scale production purposes, one of the preferred deposition techniques is lowpressure MOCVD (LP-MOCVD).…”

Section: Introductionmentioning

confidence: 99%

“…One possible solution to achieve this goal is to use nano-textured TCO surfaces [9]. In contrast to LP-MOCVD layers, sputtered ZnO films require one additional wet etching process step to achieve a rough lightscattering surface [5]. In addition, achieving sufficiently low sheet resistance ( o20 O/&) necessitates micrometer-thick ZnO layers, which leads to large surface features, imposing a link between the surface morphology and the electrical conductivity of LP-MOCVD ZnO.…”

Section: Introductionmentioning

confidence: 99%

Control of CVD-deposited ZnO films properties through water/DEZ ratio: Decoupling of electrode morphology and electrical characteristics

Nicolay

Benkhaira

Ding

et al. 2012

Solar Energy Materials and Solar Cells

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Modified Thornton model for magnetron sputtered zinc oxide: film structure and etching behaviour

Cited by 339 publications

References 11 publications

Investigation of DC magnetron-sputtered TiO2 coatings: Effect of coating thickness, structure, and morphology on photocatalytic activity

Investigation of DC magnetron-sputtered TiO2 coatings: Effect of coating thickness, structure, and morphology on photocatalytic activity

The effect of front ZnO:Al surface texture and optical transparency on efficient light trapping in silicon thin-film solar cells

Control of CVD-deposited ZnO films properties through water/DEZ ratio: Decoupling of electrode morphology and electrical characteristics

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