2024
DOI: 10.1088/1402-4896/ad196b
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Modulation of electrical properties of sputtered Ta2O5 films by variation of RF power and substrate temperature

Kiran K Sahoo,
Diana Pradhan,
Surya P Ghosh
et al.

Abstract: Dielectric thin films are important building blocks of microelectronic devices, and hence, research on the development of high-k dielectric thin films has drawn tremendous research interest. In this research, thin films of tantalum oxide (Ta2O5), a high-k dielectric material, are deposited on the Si substrate by the radio frequency (RF) magnetron sputtering technique. During the deposition of Ta2O5 thin film, the sputtering parameters such as sputtering power and substrate temperature were systematically varie… Show more

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