2022
DOI: 10.1021/acsaem.2c02933
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Modulation of the TCO/MoOx Front Contact Enables >21% High-Efficiency Dopant-Free Silicon Solar Cells

Abstract: Highly efficient dopant-free silicon solar cell requires effective electron-and hole-selective contacts. We have recently reported a remarkable efficiency of 21.3% for dopant-free silicon solar cells with a low work function and transparent and conductive MgF x O y electron extraction. The transparent conductive oxide (TCO) films and molybdenum oxide (MoO x ) front hole contact also play significant roles in the high efficiency of dopant-free solar cells. In this study, zinc-doped indium oxide (IZO), tin-doped… Show more

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Cited by 6 publications
(2 citation statements)
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“…However, in this work, the ITO thickness was reduced below 20 nm to investigate graphene as an alternative indium-free transparent electrode. In silicon heterojunction technology, it is known that the electrode work function can significantly impact the band alignment at the corresponding contact [ 37 , 38 , 39 ]. Something similar may be expected for the non-conventional solar cells studied here.…”
Section: Resultsmentioning
confidence: 99%
“…However, in this work, the ITO thickness was reduced below 20 nm to investigate graphene as an alternative indium-free transparent electrode. In silicon heterojunction technology, it is known that the electrode work function can significantly impact the band alignment at the corresponding contact [ 37 , 38 , 39 ]. Something similar may be expected for the non-conventional solar cells studied here.…”
Section: Resultsmentioning
confidence: 99%
“…To address these issues, dopant-free electron- and hole-selective contacts (ESCs and HSCs) have been developed to form heterojunctions with c-Si and selectively extract electrons and holes from c-Si while blocking the opposite charges, respectively. ESCs are mainly low-workfunction materials, e.g., Ca and Mg. At the metal/c-Si interface, substoichiometric ZnS, TiO x , MgO x , and SiO x , can be introduced for passivation and substoichiometric LiF x ,,, and MgF x can be applied to lower the interfacial barrier. HSCs are mainly high-workfunction materials, e.g., MoO x , ,,, WO x , , V 2 O x , ,, NiO x , , Cu 2 O, etc. Hole selectivity can be further boosted by a ultrathin layer of SiO x or Al 2 O 3 layer inserted between those metal oxides and the c-Si surface.…”
Section: Introductionmentioning
confidence: 99%