2002
DOI: 10.1063/1.1484554
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Molecular-beam epitaxial growth of GaAs and InGaAs/GaAs nanodot arrays using anodic Al2O3 nanohole array template masks

Abstract: Highly ordered arrays of nanosized GaAs-based dots were successfully prepared on GaAs (001) substrates by molecular-beam epitaxy using selected area growth. Selected area growth employed alumina nanochannel array (NCA) templates formed by anodic oxidation, bonded to the GaAs substrates. Homogeneous GaAs dots, as well as compositionally modulated heterostructures within the nanosized dots, were demonstrated. In the latter case, multilayer InGaAs/GaAs heterostructured nanodot arrays were fabricated. Dot growth o… Show more

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Cited by 124 publications
(90 citation statements)
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“…The direct MBE growth of GaMnAs nanodots through a porous alumina deposition mask has not been successful 22 in spite of the successful growth of GaAs and AlGaAs nanodots using a deposition mask. 23,24 This is attributed to the required low growth temperature of GaMnAs ͑Ref. 25͒ at ϳ250°C, which is evidently too low to allow the Mn to migrate through the pores.…”
Section: Resultsmentioning
confidence: 99%
“…The direct MBE growth of GaMnAs nanodots through a porous alumina deposition mask has not been successful 22 in spite of the successful growth of GaAs and AlGaAs nanodots using a deposition mask. 23,24 This is attributed to the required low growth temperature of GaMnAs ͑Ref. 25͒ at ϳ250°C, which is evidently too low to allow the Mn to migrate through the pores.…”
Section: Resultsmentioning
confidence: 99%
“…These results should provide an effective way for controlling Dirac fermions in artificial crystal structure. Experimentally, the fabrication of periodic semiconductor QDs array have been realized by several methods, [19][20][21][22] such as self-organized anisotropic strain engineering method and the molecular-beam epitaxy using selected area growth, and so on. The lattice period as well as the unit cell structure could be tunable by regulating the lattice using lithography.…”
Section: Resultsmentioning
confidence: 99%
“…The other sort of approach relies on nanoscale selective area epitaxy (NSAE) on a prepatterned substrate or growth template. The nanopatterning of substrates/templates can be realized by a variety of lithographic or nonlithographic techniques, such as interference lithography, [13,14] anodic oxidation of aluminum to form nanoporous alumina, [15][16][17][18] nanosphere lithography, [19] focused ion beam sputtering, [20] and electron-beam lithography (EBL). [21][22][23][24] At present, state-of-the-art EBL allows the creation of patterns with versatile physical geometry and localization, and homogeneous, tunable size.…”
mentioning
confidence: 99%