2015
DOI: 10.1038/srep16275
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Molecular dynamics investigations of mechanical behaviours in monocrystalline silicon due to nanoindentation at cryogenic temperatures and room temperature

Abstract: Molecular dynamics simulations of nanoindentation tests on monocrystalline silicon (010) surface were conducted to investigate the mechanical properties and deformation mechanism from cryogenic temperature being 10 K to room temperature being 300 K. Furthermore, the load-displacement curves were obtained and the phase transformation was investigated at different temperatures. The results show that the phase transformation occurs both at cryogenic temperatures and at room temperature. By searching for the prese… Show more

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Cited by 80 publications
(26 citation statements)
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“…Already in our previous report [19] we mentioned a number of studies on Si [40][41][42]. Research in this material is still very active as is evidenced by the large number of recent publications [43][44][45][46][47][48].…”
Section: Simentioning
confidence: 99%
See 1 more Smart Citation
“…Already in our previous report [19] we mentioned a number of studies on Si [40][41][42]. Research in this material is still very active as is evidenced by the large number of recent publications [43][44][45][46][47][48].…”
Section: Simentioning
confidence: 99%
“…Du et al [43] report a temperature effect in nanoindentation between 10 and 300 K; with plastic indentation depth increasing and hardness decreasing when temperature increases. In addition they find an influence of the temperature on the crystalline solid-solid transformations occurring under the Tersoff potential.…”
Section: Simentioning
confidence: 99%
“…where V(r) is a pair potential energy function, D = 0.435 eV is the cohesion energy, α = 4.6487 Å −1 is relevant to the elastic modulus, r and r 0 = 1.9475 Å are the instantaneous and equilibrium distance between two atoms, respectively [21,33].…”
Section: Simulation Model and Methodologymentioning
confidence: 99%
“…where V(r) is a pair potential energy function, D = 0.435 eV is the cohesion energy, α = 4.6487 Å −1 is relevant to the elastic modulus, r and r0 = 1.9475 Å are the instantaneous and equilibrium distance between two atoms, respectively [21,33]. In the CMP process, ceria particles are usually used as abrasive particles with higher hardness when compared to monocrystalline silicon [30], which can be treated as rigid particles.…”
Section: Simulation Model and Methodologymentioning
confidence: 99%
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