2013
DOI: 10.1016/j.procir.2013.06.141
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Molecular Dynamics Modeling of Nanoscale Machining of Silicon

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Cited by 16 publications
(8 citation statements)
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“…As part of the experiment, the authors investigated the relationship between the cutting edge radius and the minimum uncut chip thickness, as well as the chip formation process and deformations of the subsurface layer. In the following years, many studies of the nanometric cutting process were carried out using MD methods [ 55 , 56 ]. These works concerned only nanoscale cutting (with thicknesses of cut in the range of several nanometers).…”
Section: Simulation/numerical Methods For Minimum Uncut Chip Thickness Determinationmentioning
confidence: 99%
“…As part of the experiment, the authors investigated the relationship between the cutting edge radius and the minimum uncut chip thickness, as well as the chip formation process and deformations of the subsurface layer. In the following years, many studies of the nanometric cutting process were carried out using MD methods [ 55 , 56 ]. These works concerned only nanoscale cutting (with thicknesses of cut in the range of several nanometers).…”
Section: Simulation/numerical Methods For Minimum Uncut Chip Thickness Determinationmentioning
confidence: 99%
“…This simulation technique is an important method used in the atomic scale process due to its high efficiency in this field [187]. This approach is used to model and simulate scratching the polycrystalline and monocrystalline silicon carbide with diamond grit to predict the behavior of the material removal [188][189][190]. This method is also used in simulating the process of copper milling as it has proved its efficiency in investigating the deformation in copper machining [191].…”
Section: Prepare For System Setup Energy Minimizationmentioning
confidence: 99%
“…Monocrystalline Silicon is an important structural and optical material [1] and is broadly used in micro/nanoelectromechanical systems [2]. It has a typically fragile behavior at room temperature and atmospheric pressure [3]. This brittle response may be partially reverted to ductile when the deformation process reaches a transition pressure value related to phase transformation hindering the manifestation of deleterious microcrack propagation into the surface and subsurface of the semiconductors crystal [4,5].…”
Section: Introductionmentioning
confidence: 99%