2012
DOI: 10.1016/j.jcrysgro.2012.04.022
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Molecular dynamics simulation of diffusion behavior of N atoms on the growth surface in GaN solution growth

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Cited by 5 publications
(3 citation statements)
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“…Thus, to better understand the effect of N adatoms (adsorbed on the sidewalls) on the diffusion behavior of Ga adatoms, we analyzed the diffusion coefficient, which was previously studied in GaAs and GaN systems. [20][21][22] We used new systems that contain various numbers of N adatoms (0, 20, and 40) adsorbed on the ð10 10Þ sidewall, and a fixed number of Ga adatoms (10) near the sidewall. N adatoms were constrained in their position and prevented from desorption in the MD simulations, enabling us to investigate the dependence of Ga adatom diffusion on the number of N adatoms on the sidewalls.…”
Section: Resultsmentioning
confidence: 99%
“…Thus, to better understand the effect of N adatoms (adsorbed on the sidewalls) on the diffusion behavior of Ga adatoms, we analyzed the diffusion coefficient, which was previously studied in GaAs and GaN systems. [20][21][22] We used new systems that contain various numbers of N adatoms (0, 20, and 40) adsorbed on the ð10 10Þ sidewall, and a fixed number of Ga adatoms (10) near the sidewall. N adatoms were constrained in their position and prevented from desorption in the MD simulations, enabling us to investigate the dependence of Ga adatom diffusion on the number of N adatoms on the sidewalls.…”
Section: Resultsmentioning
confidence: 99%
“…In summary, the application of the present method to simple, generally used measurements, such as the PDF and ADF, helped greatly to elucidate the mechanism of crystallization from a melt. We expect that the method will contribute to elucidating the crystallization mechanisms not only for a simple single-component system, but also for complicated multicomponent systems, such as for the crystallization of minerals 16 , 34 38 , clathrate hydrates 39 41 , and materials for devices 1 , 42 44 .…”
Section: Discussionmentioning
confidence: 99%
“…17) Therefore, the parameters can be used for GaN growth simulation. The parameters have been successfully employed for vapor deposition 18,19) and melt growth 20,21) of GaN so far.…”
Section: Potential Functionmentioning
confidence: 99%