2001
DOI: 10.1557/proc-681-i2.3
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Molecular dynamics simulations of wafer bonding

Abstract: Molecular dynamics simulations using empirical potentials have been employed to describe atomic interactions at interfaces created by the macroscopic wafer bonding process. Investigating perfect or distorted surfaces of different semiconductor materials as well as of silica enables one to study the elementary processes and the resulting defects at the interfaces, and to characterize the ability of the potentials used. Twist rotation due to misalignment and bonding over steps influence strongly the bondability … Show more

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Cited by 3 publications
(2 citation statements)
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“…The different surface conditions of different oxides and the different chemical behaviour of surface silanol groups were also explained by other authors [26]. The phenomenological models of the wafer bond mechanism were mainly confirmed by molecular dynamic simulations [24,27].…”
Section: Hydrophilic Wafer Bondingsupporting
confidence: 52%
“…The different surface conditions of different oxides and the different chemical behaviour of surface silanol groups were also explained by other authors [26]. The phenomenological models of the wafer bond mechanism were mainly confirmed by molecular dynamic simulations [24,27].…”
Section: Hydrophilic Wafer Bondingsupporting
confidence: 52%
“…The phenomenological models of the wafer bond mechanism were mainly confirmed by molecular dynamic simulations [38,41].…”
Section: Hydrophilic Wafer Bondingmentioning
confidence: 82%