2014
DOI: 10.1021/jp502707d
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Molecular Dynamics Study on the Self-Assembled Monolayer Grown from a Droplet of Alkanethiol

Abstract: Direct-write lithography, where a nanoscale tip or a stamp serves as a molecular source, is used widely to fabricate self-assembled monolayers (SAMs), nanometers in size. The spatially narrow deposition of molecules creates a droplet, which then spreads to form an ordered SAM. Currently, the dynamics and mechanism for this spreading are largely unknown. Herein, the evolution of a droplet of 1-octadecanethiol into a circular island of SAM, where the sulfur atoms and alkyl chains are densely and orderly packed, … Show more

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Cited by 16 publications
(41 citation statements)
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“…25 To account for thermal and structural disorder from a computational point of view, in particular for quantitatively predicting the change in surface potential induced by the SAM, it is necessary to resort to classical models that allow simulating sufficiently large structures 3 (composed at the very minimum by hundreds of molecules). 26,27 By employing the atomistic molecular dynamics technique, we investigate and compare the microscopic structure of two popular SAMs with different polarity, formed by either n-octadecyltrichlorosilane (OTS) or perfluorodecyltrichlorosilane (FDTS) (Figure 1). The recent simulation literature on octadecyl SAMs on metal surfaces is quite abundant, in particular with many studies by Saha and coworkers describing the SAM stability and its dynamics at different partial coverages on gold substrates.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…25 To account for thermal and structural disorder from a computational point of view, in particular for quantitatively predicting the change in surface potential induced by the SAM, it is necessary to resort to classical models that allow simulating sufficiently large structures 3 (composed at the very minimum by hundreds of molecules). 26,27 By employing the atomistic molecular dynamics technique, we investigate and compare the microscopic structure of two popular SAMs with different polarity, formed by either n-octadecyltrichlorosilane (OTS) or perfluorodecyltrichlorosilane (FDTS) (Figure 1). The recent simulation literature on octadecyl SAMs on metal surfaces is quite abundant, in particular with many studies by Saha and coworkers describing the SAM stability and its dynamics at different partial coverages on gold substrates.…”
Section: Introductionmentioning
confidence: 99%
“…The recent simulation literature on octadecyl SAMs on metal surfaces is quite abundant, in particular with many studies by Saha and coworkers describing the SAM stability and its dynamics at different partial coverages on gold substrates. [27][28][29][30][31] Turning to SiO 2 surfaces, alkoxysilane-coated SiO 2 nanoparticles have been simulated both in vacuum 32 and in alkane solvents; 26 Ewers and Batteas also studied functionalized silica interfaces, focusing on the modification of friction and attractive forces introduced by OTS coatings. 33 and forming, to mimic the SAM formation process, 36 but obtaining tilt angles quite far from experimental estimates.…”
Section: Introductionmentioning
confidence: 99%
“…Another distinct mechanism, namely hopping down, was accounted by Saha et al for the adsorption of ODT molecules on the bare surface. In the hopping‐down process, the molecules diffuse on top of the SAM island reach to the edge of the SAMs island and slid down to the surface . But, at room temperature, we did not observe such mechanism due to the presence of bulk DDT SAM matrix which restricted this adsorption pathway by causing unavailable space and hindrance.…”
Section: Resultsmentioning
confidence: 61%
“…In serial pushing mechanism (Fig. ), the numbered molecules sitting on top of the ODT SAM island push the molecules below away, perforate down, and eventually adsorb to the surface . Another distinct mechanism, namely hopping down, was accounted by Saha et al for the adsorption of ODT molecules on the bare surface.…”
Section: Resultsmentioning
confidence: 99%
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