2022
DOI: 10.1116/6.0002249
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Molecular layer deposition of alucone in high aspect ratio trenches: The effect of TMA outgassing on step-coverage

Abstract: Infiltration of trimethylaluminum (TMA) in molecular layer deposition-enabled alucone thin films on planar substrates is a common observation reported in the literature. An insufficient TMA purge time in such cases is often found to lead to a CVD component in the overall film growth due to the reactions between the outgassing TMA and the co-reactant. In this work, the effect of the CVD component on the step coverage of alucone films when grown in high-aspect ratio trenches is studied. The thickness was initial… Show more

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