2021
DOI: 10.1063/5.0062140
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Molybdenum carbonitride deposited by plasma atomic layer deposition as a Schottky contact to gallium nitride

Abstract: Molybdenum carbonitride films prepared by plasma enhanced atomic layer deposition were studied for use as Schottky contacts to n-type gallium nitride. Deposited using bis(tertbutylimino)bis(dimethylamino)molybdenum and a remote plasma N2/H2 plasma, the diodes capped with Ti/Au displayed excellent rectifying behavior with a barrier height of 0.87 ± 0.01 eV and an ideality factor of 1.02 ± 0.01 after annealing at 600 °C in N2. These characteristics surpass those of pure metal nitride Schottky diodes, possibly du… Show more

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Cited by 5 publications
(2 citation statements)
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“…Molybdenum­(VI) bis­(imido) compounds have a wide range of applications, including their use as olefin metathesis catalysts, , oxygen atom transfer reagents, and vapor-phase deposition precursors. The reactivity of these industrially relevant compounds has been extensively studied, but the mechanism of their thermal decomposition remains poorly understood. Both the temperature at which and the mechanism by which a compound decomposes must be understood so that the primary decomposition pathways can be blocked effectively through ligand and complex design to enhance thermal stability. Understanding the thermal decomposition of compounds is particularly relevant to chemical vapor deposition (CVD) and atomic layer deposition (ALD) .…”
Section: Introductionmentioning
confidence: 99%
“…Molybdenum­(VI) bis­(imido) compounds have a wide range of applications, including their use as olefin metathesis catalysts, , oxygen atom transfer reagents, and vapor-phase deposition precursors. The reactivity of these industrially relevant compounds has been extensively studied, but the mechanism of their thermal decomposition remains poorly understood. Both the temperature at which and the mechanism by which a compound decomposes must be understood so that the primary decomposition pathways can be blocked effectively through ligand and complex design to enhance thermal stability. Understanding the thermal decomposition of compounds is particularly relevant to chemical vapor deposition (CVD) and atomic layer deposition (ALD) .…”
Section: Introductionmentioning
confidence: 99%
“…Molybdenum(VI) bis(imido) compounds have a wide range of applications, including their use as olefin metathesis catalysts, 89,90 oxygen atom transfer reagents, [91][92][93][94] and vapor phase deposition precursors. 36,76,84,104,[121][122][123][124][128][129][130][131][132][135][136][137][138][139][141][142][143][144][145][146]169,[171][172][173][174][175][176][177]180,[231][232][233] The reactivity of these industrially relevant compounds has been extensively studied, but the mechanism of their thermal decomposition remains poorly understood. Both the temperature at which and the mechanism by which a compound decomposes must be understood so that the primary decomposition pathways can be blocked effectively through ligand and complex design to enhance thermal stability.…”
Section: Introductionmentioning
confidence: 99%