Molybdenum diselenide thin films grown by atomic layer deposition: An XPS analysis

Abstract

Molybdenum diselenide (MoSe2) thin films were deposited on annealed titanium foils by Atomic Layer Deposition (ALD) using suitable precursors. In this work, a detailed XPS analysis of the MoSe2 film is presented. Survey spectra, Mo 3d, Se 3d, Mo 3p, Se LMM, Se 3p, C 1s, Se 4s core level along with the valence band spectra were measured. Quantitative analysis indicates a surface composition of MoSe1.8, suggesting a deficiency of selenium on the surface.

Deposition of MoSe2 flakes using cyclic selenides

“…Instead, the binding energy of Mo 3d at 228.3 eV corresponding to MoSe 2 was used for this purpose. 25,26 As compared to the XPS results obtained in our previous work from the MoSe 2 deposited using selenides 1 and 3, 15 one must notice relevant differences: (i) the absence of chlorine residues (mainly present by Mo-Cl species) and (ii) the well-dened Se 3d doublet. Those differences suggested the absence of impurities (other chemical species) and complete ligand exchange reaction between selenide 6 and MoCl 5 resulting in a high purity as-deposited ALD MoSe 2 .…”

“…Instead, the binding energy of Mo 3d at 228.3 eV corresponding to MoSe 2 was used for this purpose. 25,26 Fig. S33 † shows the XPS survey spectra for MoSe 2 deposited at 300 °C on glass, annealed Ti foils and Si wafer, whereas Fig.…”

“…Due to the strong overlapping of C 1s signal with Se LMM, the binding energy scale was referenced to the binding energy of Mo 3d at 228.3 eV corresponding to MoSe 2 . 25,26 The deconvolution of the Mo 3d spectra included the use of eight components since Mo 3d has a strong overlapping with the Se 3s signal. From those, six components corresponded to the three spin-orbit splitting of Mo 3d, Mo 3d 5/2 and Mo 3d 3/2 , i.e.…”

Atomic Layer Deposition of MoSe2 Nanosheets on TiO2 Nanotube Arrays for Photocatalytic Dye Degradation and Electrocatalytic Hydrogen Evolution

“…Due to the strong overlapping of C 1s signal with Se LMM, the binding energy scale was referenced to the binding energy of Mo 3d at 228.3 eV corresponding to MoSe2. 65 X-ray diffraction (XRD) analysis was carried out using Panalytical Empyrean with Cu tube and Pixcel3D detector. Grazing incidence XRD was performed to obtain diffraction peaks of the asdeposited MoSe2.…”

Organoselenium Precursors for Atomic Layer Deposition

“… 13 Subsequent ALD with 4 and commercial Mo precursors MoCl 5 , Mo(CO) 6 , and Mo(NMe 2 ) 2 (N t Bu) 2 was attempted at different substrates. It turned out that 4 undergoes exchange reaction with MoCl 5 to form MoSe 2 nanostructures, 14 while the other two Mo precursors proved to be ineffective. Moreover, the fundamental properties of 4 can be significantly altered by the appended alkyl chains.…”