2007 IEEE 34th International Conference on Plasma Science (ICOPS) 2007
DOI: 10.1109/ppps.2007.4345617
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Monitor of the Chamber Wall Condition in Plasma Etching Process by APM Sensor

Che-Pei Chang
1
,
Di Lai
2
,
Chun-Yu Hsieh
3
et al.

Abstract: We developed a novel acoustic plate mode (APM) sensor' for

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