Monitoring and Control in Vapor phase Epitaxy

Abstract

Monitoring and control in epitaxy based on chemical vapor deposition is a challenge created by growth conditions that often preclude more common sensors like thermocouples and mass spectrometry. We report results of experiments to measure and control temperature and flux by non-invasive optical sensing. We have developed a temperature control system with precision and accuracy better that 5'C. Satisfactory control of flux poses difficulties that will require innovative solutions before a useful control system can be developed.