Photodetectors, converting optical signals to electrical signals, play a significant role in our daily life. Two-dimensional (2D) materials, such as graphene and transition metal dichalcogenides (TMDs), have displayed excellent mechanical, optical, electric, thermal properties and have been proved to be appealing building blocks for optoelectronic applications. However, for the 2D material-based photodetectors, their responsivity, response speed, and detectivity, which are key figures of merit for photodetectors, are still far from satisfying and restrict practical applications due to lack of highquality heterojunctions and poor light absorption of atom-thin 2D materials. In contrast, three-dimensional (3D) semiconductor materials, typically referring to thin films, have strong light absorption and tunable electronic properties. The implementation of hybrid systems to form high-quality 2D/3D hybrid heterojunctions is thus considered as a simple and feasible approach to harness both the advantages of 2D and 3D materials. Up to now, significant effort has been devoted to construct different 2D/3D hybrid heterojunctions and the progress paves the way toward high-performance photodetectors.Silicon (Si), the typical and mature thin film semiconductor, counts a perfect platform to combine with 2D materials. Constructing high-quality 2D/Si hybrid heterojunctions can not only facilitate the separation and transportation of photo-induced carriers, but also compensate the limited spectral bandwidth of Si (especially for infrared applications) owing to the *Corresponding author (email: wdhu@mail.sitp.ac.cn) wide absorption spectra of different 2D materials. Graphene, which possesses unique Dirac cone band structure with high carrier mobility (~10 5 cm 2 /V·s), could act as both transparent conductive electrode and active layer to form junction with crystalline Si [1]. The monolayer graphene (MLG)/Si heterojunction formed by simple solution transfer method could operate without external bias voltage and displayed a fast response speed of~100 µs due to the strong built-in electric field. In addition, the device with a large specific detectivity (D * ) of~10 13 Jones showed pronounced sensitivity for weak near-infrared (NIR) light detection. Besides Si, other traditional semiconductors like germanium (Ge) [2] and GaAs [3] also exhibited great potential to integrate with atomically thin 2D materials for high-performance photodetectors.Apart from semimetallic graphene, TMDs with tunable energy spectrum enable the wide range light-matter interaction and can be utilized as optical materials. Wang et al. [4] deposited MoS 2 films on Si substrate with a scalable sputtering method to construct high-quality MoS 2 /Si p-n heterojunction. Significantly, the MoS 2 films possessed a unique vertically standing layered structure. The atomic layers were perpendicular to the substrate, which was conducive to transportation of photo-generated carriers. As a result, the self-driven device displayed excellent performance with high detectivi...