2021 IEEE International Symposium on Circuits and Systems (ISCAS) 2021
DOI: 10.1109/iscas51556.2021.9401245
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Monolithic 3D SRAM Cell with Stacked Two-Dimensional Materials Based FETs at 2nm Node

Abstract: Fig. 1. (a) Schematic of monolithic 3D (M3D) stacking with interlayer dielectric (ILD) between 2D material NFET and PFET. (b) 2D material based high density (HD) and high performance (HP) SRAM designs. Stacked 2D material transistors are used to adjust the SRAM beta ratio without area penalty.

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