2017
DOI: 10.1109/jeds.2017.2660531
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Monolithic Fabrication of InGaAs/GaAs/AlGaAs Multiple Wavelength Quantum Well Laser Diodes via Impurity-Free Vacancy Disordering Quantum Well Intermixing

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Cited by 7 publications
(5 citation statements)
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“…In this work, 1.06-µm InGaAs/GaAs DQW laser structures, with asymmetric waveguide, were grown on n-GaAs (100) substrates by metalorganic chemical vapor deposition (MOCVD). The detailed epitaxial structure is shown in the Table 1 , similar to our previous study 24 .…”
Section: Device Overview and Experimental Setupsupporting
confidence: 57%
“…In this work, 1.06-µm InGaAs/GaAs DQW laser structures, with asymmetric waveguide, were grown on n-GaAs (100) substrates by metalorganic chemical vapor deposition (MOCVD). The detailed epitaxial structure is shown in the Table 1 , similar to our previous study 24 .…”
Section: Device Overview and Experimental Setupsupporting
confidence: 57%
“…Ti/Au layers were evaporated to form ohmic contact of the p-side, and Ni/Ge/ Au/Ni/Au layers were used as n-side ohmic contact after substrate thinning of the wafer. The details of the laser fabrication process can be found in the references [14][15][16][17].…”
Section: Structural Design and Experimental Detailsmentioning
confidence: 99%
“…In this work, 1.06-µm InGaAs/GaAs DQW laser structures, with asymmetric waveguide, were grown on n-GaAs(100) substrates by metalorganic chemical vapor deposition (MOCVD). The detailed epitaxial structure is shown in the Table I , similar to our previous study [22]. B.…”
Section: A Materials Structurementioning
confidence: 55%