“…These materials were applied in rapid reactions at high temperatures to avoid both the formation of residual compounds derived from the reaction of the products and the formation of hot spots on the catalyst that change the structure of the metallic phase. The inert substrates have various shapes such as tubes, [1][2][3] plates, [4][5][6] honeycombs, [7][8][9] and foams, [5,[10][11][12] among others. In addition, the coating methods used to deposit thin films on substrates, such as washcoating, [8,13,14] sol-gel deposition, [2,15,16] electrophoretic deposition, [17,18] chemical vapour deposition (CVD), [5,19,20] powder plasma spraying, [21][22][23] and physical vapour deposition (PVD), [24][25][26] among others, are diverse.…”