1990
DOI: 10.1049/el:19900277
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Monte Carlo comparison of heterojunction cathode Gunn oscillators

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Cited by 7 publications
(2 citation statements)
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“…Thus the doping level of the drift region was chosen to be much larger than typically used for GaAs or InP Gunn devices. 45,46 Since the mobility of GaN is lower in comparison to both GaAs and InP, the time required to build up a stable domain is higher for the same background doping. The higher doping chosen here helps offset the lower mobility value.…”
Section: Monte Carlo Simulation Detailsmentioning
confidence: 99%
“…Thus the doping level of the drift region was chosen to be much larger than typically used for GaAs or InP Gunn devices. 45,46 Since the mobility of GaN is lower in comparison to both GaAs and InP, the time required to build up a stable domain is higher for the same background doping. The higher doping chosen here helps offset the lower mobility value.…”
Section: Monte Carlo Simulation Detailsmentioning
confidence: 99%
“…The launcher is designed to be wide enough to resist low-energy tunneling but narrow enough to limit resistance. The doping spike following the launcher is required to achieve the desired electrical field in the transit region and avoid the development of a depletion region in the transit region [5], [6] [7] [8]. The transit region lengths and doping concentrations that were used to observe the double Gunn effect are listed in table 1.…”
Section: Graded Gap Injectormentioning
confidence: 99%