2000
DOI: 10.1016/s0022-0248(99)00836-2
|View full text |Cite
|
Sign up to set email alerts
|

Monte Carlo modeling of silicon crystal growth

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

3
52
0

Year Published

2006
2006
2024
2024

Publication Types

Select...
7
2

Relationship

0
9

Authors

Journals

citations
Cited by 83 publications
(55 citation statements)
references
References 11 publications
3
52
0
Order By: Relevance
“…This suggests the presence of {1 1 1} facets in the solid, that do not evolve as fast as other orientations, as previously observed in Refs. [9,16,21,26]. In other words, the broad faces of a given particle, suggested to be of {1 1 1} type, appear to be growing much slower with respect to the edges of the particle, giving rise to the observed structural changes [26].…”
Section: D Reconstructionsmentioning
confidence: 99%
See 1 more Smart Citation
“…This suggests the presence of {1 1 1} facets in the solid, that do not evolve as fast as other orientations, as previously observed in Refs. [9,16,21,26]. In other words, the broad faces of a given particle, suggested to be of {1 1 1} type, appear to be growing much slower with respect to the edges of the particle, giving rise to the observed structural changes [26].…”
Section: D Reconstructionsmentioning
confidence: 99%
“…In addition, the {1 1 1} planes have very low interfacial mobility: the Jackson a factor [15] for Si {111} is 2.7 [16]; the relatively high value of a (a f111g > 2) indicates that the {111} surface is likely atomically smooth and thus there is a barrier to nucleation of the next atomic layer [16,15]. Beatty and Jackson [16] simulated the growth of Si using a Monte Carlo scheme; they found that the growth rate, v, increases linearly with undercooling, DT, for a rough Si {1 0 0} plane while v varies exponentially with DT for a {1 1 1} facet in a 2D poly-nuclear growth mode [16,17]. For low undercooling, then, the growth velocity on a facet plane is much smaller than on a rough plane.…”
Section: Introductionmentioning
confidence: 99%
“…In the model the fourfold symmetry of interface energy is assumed but both are in good agreement when the upper envelope of the experimental data is concerned. The values of linear kinetic coefficient for h100i and h111i faces of silicon have been obtained by numerical simulations 28,29) or experiments, [30][31][32] and most of the data for a (100) face of silicon are in the range from 0.2 to 0.05 m/sK. The value of linear kinetic coefficient for a Si-6 mass%Ni alloy is reported to be 0.01 m/sK 33) and it is supposed to becomes small with increase of solute content because the driving force for solute partition at interface would be necessary.…”
Section: Methodsmentioning
confidence: 99%
“…This feature makes our model slightly different with respect to conventional solid-on-solid models, which formally disallow vacancy formation in the bulk crystal. 12,14 In Fig. 3, a snapshot of the undercoordinated atoms, obtained after t = 2.613 ns of simulated evolution of an undercooled partially molten Si system ͑T = 1660 K͒, is shown.…”
Section: Atomistic Simulation Of Ultrafast Regrowth Phenomenamentioning
confidence: 99%