2005
DOI: 10.1039/b417292b
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Morphological and structural control of nanostructured <100> oriented CeO2 films grown on random metallic substrates

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Cited by 36 publications
(18 citation statements)
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“…112,380,453−455 The X-ray patterns of all samples grown in the 350−550°C temperature range pointed to the formation of (100) oriented CeO 2 films, while at higher deposition temperatures (650−850°C) random CeO 2 films were formed. As expected, the surface morphology depended on the deposition temperature and changed from star-like grains to round-shaped islands upon increasing the deposition temperature for a constant deposition time of 1 h. 455 The SEM images of CeO 2 samples, deposited in the 350−550°C range, showed uniform, adherent films with well-linked grains ( Figure 38). …”
Section: General Overview Of Precursors For Metal Oxidementioning
confidence: 72%
“…112,380,453−455 The X-ray patterns of all samples grown in the 350−550°C temperature range pointed to the formation of (100) oriented CeO 2 films, while at higher deposition temperatures (650−850°C) random CeO 2 films were formed. As expected, the surface morphology depended on the deposition temperature and changed from star-like grains to round-shaped islands upon increasing the deposition temperature for a constant deposition time of 1 h. 455 The SEM images of CeO 2 samples, deposited in the 350−550°C range, showed uniform, adherent films with well-linked grains ( Figure 38). …”
Section: General Overview Of Precursors For Metal Oxidementioning
confidence: 72%
“…7 Lin and Chowdhury 8 published a review on nanostructured cerium oxide and its various applications, especially several industrially important reactions, including lowtemperature CO oxidation, UV absorbing semiconductor materials, partial oxidation of hydrocarbons, hydrogenation of carbon oxides, and wastewater treatment. In this context, several strategies have been developed to obtain CeO 2 nanostructures with different morphologies, e.g., hydrothermal and solvothermal, and metal-organic chemical vapor deposition (MOCVD) [21][22][23][24] methods. Among these methods, hydrothermal treatments appear to be potentially interesting in terms of morphological variations.…”
mentioning
confidence: 99%
“…It was found that the (111) plane rather than the (100) plane were more preferable to be exposed as ending planes in the surface of CeO 2 . The (111) plane had a lower surface energy than that of the (100) plane [22,23]; therefore, they were energetically favorable to be formed on the surface at the late deposition stage of CeO 2 film [22][23][24][25]. A part of (111) facets overlapped each other at the ends of the elongated grains.…”
Section: Methodsmentioning
confidence: 99%