Morphological Changes in Ultraviolet-Nanoimprinted Resin Patterns Caused by Ultraviolet-Curable Resins Absorbing Pentafluoropropane

Kaneko, Shu; Kobayashi, Kei; Tsukidate, Yoshitaka; Hiroshima, Hiroshi; Matsui, Shinji; Nakagawa, Masaru

doi:10.7567/jjap.51.06fj05

Cited by 11 publications

(6 citation statements)

References 25 publications

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“…The solubility parameter is useful for the judgement of the dissolution property of additives into base monomers. 27,33) Because the BPAGDM and BPAEDM monomers have solubility parameters of 19.5 and 22.1 (J cm −3 ) 0.5 , respectively, we selected the nonionic dye with a solubility parameter of 23.3 (J cm −3 ) 0.5 close to the monomers.…”

Section: Photocuring Of a Uv-curable Resin Containing A Nonionic Dye ...mentioning

confidence: 99%

Development of UV-curable liquid for in-liquid fluorescence alignment in ultraviolet nanoimprint lithography

Ochiai¹,

Kikuchi²,

Ishito³

et al. 2018

Jpn. J. Appl. Phys.

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We studied a fluorescent UV-curable resin suitable for fluorescence alignment in UV nanoimprinting. The addition of a cationic fluorescent dye caused radical photopolymerization of a UV-curable resin by exposure to visible excitation light for fluorescence microscope observation. The microscope observation of a resin film prepared by pressing resin droplets on a silica substrate with a fluorinated silica superstrate revealed that the cationic dye molecules were preferably adsorbed onto the silica surface. It was indicated that the dye molecules concentrated on the silica surface may cause the photocuring. A nonionic fluorescent dye was selected owing to its low polar symmetrical structure and its solubility parameter close to monomers. The fluorescent UV-curable resin with the nonionic dye showed uncured stability to exposure to visible excitation light for 30 min with a light intensity of 8.5 mW cm−2 detected at 530 nm.

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Section: Photocuring Of a Uv-curable Resin Containing A Nonionic Dye ...mentioning

confidence: 99%

Development of UV-curable liquid for in-liquid fluorescence alignment in ultraviolet nanoimprint lithography

Ochiai¹,

Kikuchi²,

Ishito³

et al. 2018

Jpn. J. Appl. Phys.

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“…We demonstrated a solution strategy. 35 The absorption of PFP into the base monomers and UV-curable resins was confirmed by measuring the changes in weight upon exposure to a PFP atmosphere. The absorption of PFP is dependent on the monomer chemical structure.…”

Section: Introductionmentioning

confidence: 99%

Investigation of Fluorinated (Meth)Acrylate Monomers and Macromonomers Suitable for a Hydroxy-Containing Acrylate Monomer in UV Nanoimprinting

et al. 2014

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We investigated reactive fluorinated (meth)acrylate monomers and macromonomers that caused segregation at the cured resin surface of a viscous hydroxy-containing monomer, glycerol 1,3-diglycerolate diacrylate (GDD), and decreased the demolding energy in ultraviolet (UV) nanoimprinting with spin-coated films under a condensable alternative chlorofluorocarbon gas atmosphere. The X-ray photoelectron spectroscopy and contact angle measurements used to determine the surface free energy suggested that a nonvolatile silicone-based methacrylate macromonomer with fluorinated alkyl groups segregated at the GDD-based cured resin surface and decreased the surface free energy, while fluorinated acrylate monomers hardly decreased the surface free energy because of their evaporation during the annealing of the spin-coated films. The average demolding energy of GDD-based cured resins with the macromonomer having fluorinated alkyl groups was smaller than that with the macromonomer having hydrocarbon alkyl groups. The fluorinated alkyl groups were responsible for decreasing the demolding energy rather than the polysiloxane main chains. We demonstrated that the GDD-based UV-curable resin with the fluorinated silicone-based macromonomer was suitable for step-and-repeat UV nanoimprinting with a bare silica mold, in addition to silica molds treated by chemical vapor surface modification with trifluoro-1,1,2,2-tetrahydropropyltrimethoxysilane (FAS3) and tridecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane (FAS13).

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“…26) We have studied UV-curable resins suitable for the bubble-defect-free UV nanoimprinting. 27) Base monomers having a solubility parameter in the range of 18-22 (J cm −3 ) 0.5 absorb large amounts of PFP. PFP absorption causes decreased pattern heights and rough pattern surfaces owing to the effusion of PFP absorbed by liquid resins during photopolymerization.…”

Section: Introductionmentioning

confidence: 99%

Discharge of viscous UV-curable resin droplets by screen printing for UV nanoimprint lithography

Tanabe

Uehara

Nagase³

et al. 2016

Jpn. J. Appl. Phys.

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We demonstrated a coating method of screen printing for discharging droplets of a high-viscosity resin on a substrate for ultraviolet (UV) nanoimprint lithography (NIL). Compared with a spin-coated resin film on a silicon substrate, discharged resin droplets on a silicon substrate were effective in terms of the uniformity of residual layer thickness (RLT) in contact with a mold with various pattern densities. Fluorescence microscope observations with a fluorescent-dye-containing UV-curable resin enabled the evaluation of the shapes of resin droplets discharged on a substrate surface. Widely used screen mesh plates composed of a stainless mesh covered with a patterned emulsion film caused defects of undischarged parts, whereas defects-free resin droplets with a narrow size distribution were discharged by mesh-free plates prepared with laser ablation. The pitch-to-diameter ratio in the configuration of 10-µm-diameter holes needs to be larger than 2.5 times for printing a resin having a viscosity of 12,800 mPa s.

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Morphological Changes in Ultraviolet-Nanoimprinted Resin Patterns Caused by Ultraviolet-Curable Resins Absorbing Pentafluoropropane

Cited by 11 publications

References 25 publications

Development of UV-curable liquid for in-liquid fluorescence alignment in ultraviolet nanoimprint lithography

Development of UV-curable liquid for in-liquid fluorescence alignment in ultraviolet nanoimprint lithography

Investigation of Fluorinated (Meth)Acrylate Monomers and Macromonomers Suitable for a Hydroxy-Containing Acrylate Monomer in UV Nanoimprinting

Discharge of viscous UV-curable resin droplets by screen printing for UV nanoimprint lithography

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