Abstract:Porous silicon samples were obtained by anodization process of a n-type silicon wafer. The pores formations were investigated by varying the electrochemical parameters like as current density and etching time.The main objective of the present study is to investigate the influence of these parameters in order to increase the surface area of the porous layer. Scanning electron microscopy and optical profilometer were used for morphological characterization, such as pore size, surface area and morphological evolu… Show more
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