2016
DOI: 10.1108/cw-03-2016-0006
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Morphology and acoustic artefacts of copper deposits electroplated using megasonic assisted agitation

Abstract: Purpose ± A study of the influence of megasonic (MS) assisted agitation on Printed Circuit Boards (PCBs) electroplated using copper electrolyte solutions, to improve plating efficiencies through enhanced ion transportation. Design/methodology/approach-The impact of MS assisted agitation on topographical properties of the electroplated surfaces studied, through a Design of Experiments (DOE), by measuring surface roughness, characterised by values of the parameter Ra as measured by white light phase shifting int… Show more

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Cited by 7 publications
(9 citation statements)
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“…Spaces between metallic catalysts lead to increases in inter-pore spacing within electroless deposits, which can have a detrimental effect in terms of ductility and roughness [35,55,56]. [22].…”
Section: Reduction Of Metal Catalystsmentioning
confidence: 99%
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“…Spaces between metallic catalysts lead to increases in inter-pore spacing within electroless deposits, which can have a detrimental effect in terms of ductility and roughness [35,55,56]. [22].…”
Section: Reduction Of Metal Catalystsmentioning
confidence: 99%
“…The ability of the different metals to act as catalytic layers to receive high quality Cu deposits, is therefore reviewed in terms of Cu adhesion and conductivity. A strong adhesion of Cu to PEI and a fast processing time are desirable for long circuit lifetime and low manufacturing costs, respectively [34,35].…”
mentioning
confidence: 99%
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“…The application of high frequency acoustics induces streaming mechanisms which have the ability to improve the transport of plating solution down microfeatures [5][6][7], improving the Cu plated thickness down vias over existing agitation techniques. A MS wave is used to deliver a uniform acoustic wave to the surface of the PCB, cathode, to investigate the influence of acoustic agitation within the electrolyte solution [8][9][10][11][12]. Increases in Cu deposition depth and improved uniformity of the Cu filling were obtained for high thickness-to-width aspect ratio (ar) vias, of the order of 8:1 and 3:1 for the THV and BV, respectively, as shown in Table 1.…”
Section: Introductionmentioning
confidence: 99%
“…One disadvantage of the method is that the capacitance value increases to slow the power supply steady response. The circuit simulation method (Fuchs et al , 2013; Jones et al , 2016) has been widely used in circuit design to improve the efficiency of circuit design. The correctness and feasibility of the method are verified by simulation.…”
Section: Introductionmentioning
confidence: 99%