2015
DOI: 10.1016/j.mssp.2015.07.076
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Morphology and band gap controlled AACVD of CdSe and CdS Se1− thin films using novel single source precursors: Bis(diethyldithio/diselenocarbamato)cadmium(II)

Abstract: a b s t r a c tCadmium selenide (CdSe) and cadmium sulfoselenide (CdS x Se 1 À x ) are important semiconductor materials for photovoltaic and other optoelectronic applications. Highly crystalline thin films of CdSe and CdS x Se 1 À x have been deposited on glass substrates by Aerosol Assisted Chemical Vapour Deposition (AACVD) from bis(diethyldiselenocarbamato)cadmium(II) and a 1:1 and 2:1 mixtures of bis(diethyldiselenocarbamato)cadmium(II) and bis(diethyldithiocarbamato)cadmium(II). Films were characterised … Show more

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Cited by 19 publications
(6 citation statements)
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“…The XRD spectrum has sharp peaks corresponding to the crystal structure of cadmium sulfoselenide, including 2θ at 24.66°(100), 26.28°( 002), 27.99°(101), 36.34°(102), 43.30°(110), 47.28°(103), 50.38°(200), 51.28°(112), and 52.19°(201). 12,38 ICP-MS measurements suggested the atomic ratio of S:Se of the pigment was 1.9 ± 0.1.…”
Section: ■ Results and Discussionmentioning
confidence: 59%
See 1 more Smart Citation
“…The XRD spectrum has sharp peaks corresponding to the crystal structure of cadmium sulfoselenide, including 2θ at 24.66°(100), 26.28°( 002), 27.99°(101), 36.34°(102), 43.30°(110), 47.28°(103), 50.38°(200), 51.28°(112), and 52.19°(201). 12,38 ICP-MS measurements suggested the atomic ratio of S:Se of the pigment was 1.9 ± 0.1.…”
Section: ■ Results and Discussionmentioning
confidence: 59%
“…The observed colloidal stability can be attributed to the small size and negative surface charge of the pigment particles with a ζ-potential of −24.37 ± 1.48 mV (electrophoretic mobility of −1.91 ± 0.12 μm·cm/(V s)), which facilitates their colloidal stability through electrostatic repulsion as suggested by the Derjaguin–Landau–Verwey–Overbeek theory. , The XRD pattern of the commercial pigment is shown in Figure c. The XRD spectrum has sharp peaks corresponding to the crystal structure of cadmium sulfoselenide, including 2θ at 24.66° (100), 26.28° (002), 27.99° (101), 36.34° (102), 43.30° (110), 47.28° (103), 50.38° (200), 51.28° (112), and 52.19° (201). , ICP-MS measurements suggested the atomic ratio of S:Se of the pigment was 1.9 ± 0.1.…”
Section: Resultsmentioning
confidence: 97%
“…Polycrystalline ZnSxSe 1-x thin films were deposited by co-evaporation of ZnS and ZnSe [36], by low-pressure metal-organic chemical vapour deposition (LP-MOCVD) process from the zinc alkyls dimethylzinc (DMZ) or diethylzinc (DEZ) and H 2 Se and H 2 S [37], and by molecular beam epitaxy (MBE) using radio-frequency (RF) plasma [38]. We have recently reported the deposition of CdSe and CdSSe thin films from molecular precursors by AACVD [39]. Herein we report the deposition of highly crystalline hexagonal ZnSe thin films from bis(diethyldiselenocarbamato)zinc(II) complex and ZnSSe composite from a mixture of bis(diethyldiselenocarbamato)zinc(II) and bis(diethyldithiocarbamato)zinc(II) complexes and their detailed optical and structural characterisation.…”
Section: Introductionmentioning
confidence: 99%
“…The gas flow rate was controlled at 160 Sccm through a Platon flow gauge. The precursor mist was thermolysed in the hot zone at the surface of glass substrate and resulted in the deposition of thin film as reported previously [39].…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, limitations of CuSCN solubility and solution processability are overcome using AACVD, as the technique affords the use of high boiling point solvents, as the necessary aerosol formation depends solely on the surface tension of the solvent. AACVD has previously been used to deposit a variety of semiconductor thin films, including MoS 2 , SnS, CdSe, Cu 2 ZnSnS 4 (CZTS), and more recently CuO x . Here, we report for the first time the deposition of CuSCN using AACVD.…”
Section: Introductionmentioning
confidence: 99%