Morphology and structure of TiO2 thin layers vs. thickness and substrate temperature

Spatially Resolved EELS Fine Structures at a SiO2/TiO2 Interface

“…TEM results show that as expected Si02 is amorphous, whereas Ti02 is partially crystalline and exhibits the columnar structure usually found in evaporated films [3]. At this magnification all interfaces appear to be well defined, even after deposition of the 8th layer.…”

Anomalous C-V response correlated to relaxation processes in TiO2 thin film based-metal-insulator-metal capacitor: Effect of titanium and oxygen defects

“…3 Its variability is generally explained by the dependence of the permittivity on the crystalline phase, deposition method and process parameters of the TiO 2 . Various techniques such as thermal 4 or anodic oxidation, 5 electron beam evaporation, 6 chemical vapor deposition (CVD), 7 plasma-enhanced chemical vapor deposition, 8 sol-gel methods, 9 reactive sputtering methods, 10,11 and atomic layer deposition (ALD) [12][13][14] have been reported for TiO 2 thin film fabrication. Among them, ALD seems highly suitable for obtaining conformal films with uniform thickness even at low temperatures, 15,16 allowing the manufacturing of insulator films with desired and reproducible properties.…”

The influence of substrate chemistry on the adhesion of electrolessly deposited Ni(P) on metal oxide coated ceramics

“…Whereas the substrate roughness on a micrometre scale was not influenced by the thin substrate coatings, a strong increase in roughness was observed on a nanometre scale. It is well known [11][12][13][14][15] that e-beam evaporated metal oxide films have porosities of 10-30%, in spite of a deposition temperature of about 300 °C. The material may grow in columns and open gaps may remain between these columns [16].…”