2014
DOI: 10.1039/c4ee00688g
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Morphology control strategies for solution-processed organic semiconductor thin films

Abstract: Solution-based deposition techniques and strategies to control the morphology of organic semiconductor thin films are reviewed and discussed.

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Cited by 584 publications
(584 citation statements)
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References 112 publications
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“…Therefore, to make organic electronics competitive with the inorganic counterparts and to promote a competitive market entry, the fabrication process should rely on very simple and inexpensive approaches, in which the deposition of the organic semiconductors should ideally be performed from solution in ambient conditions. [3,4] During the last years, significant progresses have been made toward the development of viable printed electronics based on solution-processed organic field-effect transistors (OFETs). [5][6][7] The general guidelines for the requirements of OFETs are: low processing temperature (<120ºC), [8] high on/off ratio (>10 6 ), [9] high reproducibility, [10] high uniformity [11] and high stability (temperature, [12] bias stress [13] and lifetime [14] ).…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, to make organic electronics competitive with the inorganic counterparts and to promote a competitive market entry, the fabrication process should rely on very simple and inexpensive approaches, in which the deposition of the organic semiconductors should ideally be performed from solution in ambient conditions. [3,4] During the last years, significant progresses have been made toward the development of viable printed electronics based on solution-processed organic field-effect transistors (OFETs). [5][6][7] The general guidelines for the requirements of OFETs are: low processing temperature (<120ºC), [8] high on/off ratio (>10 6 ), [9] high reproducibility, [10] high uniformity [11] and high stability (temperature, [12] bias stress [13] and lifetime [14] ).…”
Section: Introductionmentioning
confidence: 99%
“…There is a wide variety of solution processing techniques used to deposit uniform, low-roughness films (27). Spin-casting is a popular laboratory-scale deposition technique due to its simplicity and ability to deposit high-quality films with a variety of materials.…”
mentioning
confidence: 99%
“…Solution-based approaches [13], suited for both small molecules and polymers with solubilizing side chains, include spin and spray coating, solutioncoating with fluid control, epitaxy, solvent-annealing and nucleation techniques -to just name a few. Vacuum processing [14], by contrast, is only applicable to small-molecular semiconductors, where vapour-phase deposition enables the fabrication of high-purity thin films with good control over thickness and chemical composition.…”
Section: Methodsmentioning
confidence: 99%