2007
DOI: 10.1007/s10853-006-0658-7
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Morphology, microstructure, and residual stress in EBPVD erbia coatings

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Cited by 7 publications
(6 citation statements)
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“…Guo et al [16] explained the formation of the B-phase by the high surface tension during formation of Er 2 O 3 nanoparticles, resulting in a high internal pressure during particle formation. We also suggest that the XRD patterns of Er 2 O 3 coatings published by Jankowski et al [11] could be explained by the formation of the B-phase at temperatures ≤580 °C. They grew the films with low energetic species by electron beam evaporation of Er 2 O 3 .…”
Section: Discussionsupporting
confidence: 64%
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“…Guo et al [16] explained the formation of the B-phase by the high surface tension during formation of Er 2 O 3 nanoparticles, resulting in a high internal pressure during particle formation. We also suggest that the XRD patterns of Er 2 O 3 coatings published by Jankowski et al [11] could be explained by the formation of the B-phase at temperatures ≤580 °C. They grew the films with low energetic species by electron beam evaporation of Er 2 O 3 .…”
Section: Discussionsupporting
confidence: 64%
“…Generally, five polymorphs are reported, but only three phases (C, H, B) have been observed for Er 2 O 3 . The cubic C-phase is the stable phase below 2600 K and is usually formed during preparation of Er 2 O 3 coatings, even if some authors report about unidentified peaks in x-ray diffractograms [7,11,12]. Above 2600 K the hexagonal H-phase occurs.…”
Section: Introductionmentioning
confidence: 99%
“…It has high thermodynamic stability, high thermal stability, high dielectric constant, wide band gap, high photo response and low permeation of hydrogen isotopes. Thus, Er2O3 coating is a promising candidate for applications such as protective coatings at fusion power plants [1,2], high dielectric gate material as a replacement for SiO2 gate insulators [3] and optoelectronic applications [4].…”
Section: Introduction*mentioning
confidence: 99%
“…Er2O3 can be deposited using various methods, including laser ablation [4], electron-beam evaporation [3], sol-gel and metal-organic decomposition [5], metal-organic chemical vapor deposition [2], magnetron sputtering [6] and filtered vacuum arc deposition, FVAD [1,7]. Among these techniques, FVAD is promising, because its plasma produces coatings with higher packing density and better adhesion than other techniques, due to high-energy metal plasma ions impinging the coated substrate.…”
Section: Introduction*mentioning
confidence: 99%
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