Morphology of pores produced in n-Si {100} by etching in hydrofluoric acid solutions

Abramova, E. N.; Khort, A. M.; Syrov, Yu. V.; Yakovenko, A. G.; Швец, В. И.

doi:10.1134/s0020168516100010

Cited by 2 publications

(1 citation statement)

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“…However, using a double-tank electrochemical cell can replace the ohmic contacts with electrolyte contacts to avoid unnecessary contamination and control the electrolyte temperature conveniently. The double-tank etching is mostly used to fabricate irregular porous silicon [36][37][38] and p-type macroporous silicon [39,40]. Few investigations have been focused on the fabrication of n-type macroporous silicon, especially for the ordered macropore arrays.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Ordered Macropore Arrays in n-Type Silicon Wafer by Anodic Etching Using Double-Tank Electrochemical Cell

Zhang,

et al. 2024

Micromachines

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In this work, ordered macropore arrays in n-type silicon wafers were fabricated by anodic etching using a double-tank electrochemical cell. The effects of the wafer thickness, etching time and voltage on the quality of macropore arrays were investigated. Homogeneous macropore arrays could be achieved in 200 μm thick silicon wafers, but could not be obtained from 300 and 400 μm thick silicon wafers. Highly ordered macropore arrays with an aspect ratio of 19 were fabricated in 200 μm thick n-type silicon at 4.5 V. The etching current decreases in 200 μm thick silicon but increases in thicker silicon with an increase in time. It demonstrates that the minority carrier transportation capability from the illuminated surface to the reactive surface is different for silicon wafers with different thicknesses. The minority carrier concentration at the illuminated surface for stable macropore formation and the current under different etching voltages were calculated based on a hole transport model. The results show that appropriately decreasing wafer thickness and increasing voltage can help stable macropore array fabrication in the illumination-limited double-tank cell.

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