1977
DOI: 10.1016/0390-5519(77)90028-x
|View full text |Cite
|
Sign up to set email alerts
|

Morphology of silicon carbide formed by chemical vapour deposition

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
2
0

Year Published

1985
1985
2016
2016

Publication Types

Select...
2
2
2

Relationship

0
6

Authors

Journals

citations
Cited by 17 publications
(2 citation statements)
references
References 26 publications
0
2
0
Order By: Relevance
“…In the following analysis, grain size is also provided in terms of the less-appropriate grain diameter using the definition above to allow for comparison with previous studies of the SiC in TRISO fuel particles [17,18]. The average reported statistics are weighted by area fraction [17] β-SiC is a material with a high probably of twin formation [22] where twins represent the dominant CSL boundary [17], [18]. Twins are the lowest energy Low-Σ CSL boundaries and are expected to serve as limited percolation pathways for GB diffusion [23,24].…”
Section: Resultsmentioning
confidence: 99%
“…In the following analysis, grain size is also provided in terms of the less-appropriate grain diameter using the definition above to allow for comparison with previous studies of the SiC in TRISO fuel particles [17,18]. The average reported statistics are weighted by area fraction [17] β-SiC is a material with a high probably of twin formation [22] where twins represent the dominant CSL boundary [17], [18]. Twins are the lowest energy Low-Σ CSL boundaries and are expected to serve as limited percolation pathways for GB diffusion [23,24].…”
Section: Resultsmentioning
confidence: 99%
“…22 A layer growth mechanism was assumed to be valid for all supersaturations when for an adatom the ratio of its adsorbed energy to its thermal energy, a, is greater than 3.5. 23 For layerby-layer growth the linear growth rate of a given face (hkl) is proportional to the rate of formation of clusters on that face.…”
mentioning
confidence: 99%