2022
DOI: 10.1016/j.apsusc.2022.154485
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MoS2/p-Si heterojunction with graphene interfacial layer for high performance 940 nm infrared photodetector

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Cited by 13 publications
(3 citation statements)
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“…Figure 8(b) shows a recently reported p-WSe 2 /n-Ge photodetector with ultrafast photoresponse, exhibiting fast rising and falling of approximately 3 µs under 638 nm illumination and 30 µs rising and 5 µs falling under 1550 nm infrared illumination [322]. Similar photodetectors based on type-II junctions between layered semiconductors and Si or Ge have been reported with various material combinations, including n-MoS 2 /p-Si [292,323], n-WS 2 /p-Si [292,324], p-WS 2 /n-Si [279], n-MoTe 2 /n-Si [325], n-SnSe 2 /p-Si [326], n-MoS 2 /p-Ge [327], n-WS 2 /n-Ge [328], and p-MoTe 2 /i-Ge [329].…”
Section: Layered-traditional-heterostructure-based P-n Junctionsupporting
confidence: 65%
“…Figure 8(b) shows a recently reported p-WSe 2 /n-Ge photodetector with ultrafast photoresponse, exhibiting fast rising and falling of approximately 3 µs under 638 nm illumination and 30 µs rising and 5 µs falling under 1550 nm infrared illumination [322]. Similar photodetectors based on type-II junctions between layered semiconductors and Si or Ge have been reported with various material combinations, including n-MoS 2 /p-Si [292,323], n-WS 2 /p-Si [292,324], p-WS 2 /n-Si [279], n-MoTe 2 /n-Si [325], n-SnSe 2 /p-Si [326], n-MoS 2 /p-Ge [327], n-WS 2 /n-Ge [328], and p-MoTe 2 /i-Ge [329].…”
Section: Layered-traditional-heterostructure-based P-n Junctionsupporting
confidence: 65%
“…Jia et al designed a self-powered broadband photodetector by constructing a heterojunction from a 2D MoS 2 film and bulk GaAs. The MoS 2 /GaAs heterojunction photodetector exhibited a broad response spectrum from deep ultraviolet (DUV) to near-infrared (NIR), a high responsivity of 35.2 mA/W, a high specific detection rate of 1.96 × 10 13 Jones, and zero-bias pressure fast response speed of 3.4/15.6 μs. …”
Section: Introductionmentioning
confidence: 99%
“…Two-dimensional (2D) transition metal dichalcogenides (TMDCs) are promising materials for use in a variety of optoelectronic device applications due to their tunable band gap, simple fabrication, intriguing excitonic properties, and high carrier mobility. Therefore, there have been extensive efforts to exploit these outstanding properties of 2D TMDCs for optoelectronics, especially photodetectors. Photodetectors are basic components of optoelectronics and have applications in various fields such as thermal imaging cameras, optical communications, machine vision technology, and more. However, 2D TMDCs have low light absorption due to their atomic-level thinness, posing a limitation for sensitive photodetection …”
mentioning
confidence: 99%